---
_id: '23638'
author:
- first_name: Artoem
  full_name: Khassanov, Artoem
  last_name: Khassanov
- first_name: Thomas
  full_name: Schmaltz, Thomas
  last_name: Schmaltz
- first_name: Hans-Georg
  full_name: Steinrück, Hans-Georg
  id: '84268'
  last_name: Steinrück
  orcid: 0000-0001-6373-0877
- first_name: Andreas
  full_name: Magerl, Andreas
  last_name: Magerl
- first_name: Andreas
  full_name: Hirsch, Andreas
  last_name: Hirsch
- first_name: Marcus
  full_name: Halik, Marcus
  last_name: Halik
citation:
  ama: Khassanov A, Schmaltz T, Steinrück H-G, Magerl A, Hirsch A, Halik M. Interface
    Engineering of Molecular Charge Storage Dielectric Layers for Organic Thin-Film
    Memory Transistors. <i>Advanced Materials Interfaces</i>. 2014;1:1400238. doi:<a
    href="https://doi.org/10.1002/admi.201400238">10.1002/admi.201400238</a>
  apa: Khassanov, A., Schmaltz, T., Steinrück, H.-G., Magerl, A., Hirsch, A., &#38;
    Halik, M. (2014). Interface Engineering of Molecular Charge Storage Dielectric
    Layers for Organic Thin-Film Memory Transistors. <i>Advanced Materials Interfaces</i>,
    <i>1</i>, 1400238. <a href="https://doi.org/10.1002/admi.201400238">https://doi.org/10.1002/admi.201400238</a>
  bibtex: '@article{Khassanov_Schmaltz_Steinrück_Magerl_Hirsch_Halik_2014, title={Interface
    Engineering of Molecular Charge Storage Dielectric Layers for Organic Thin-Film
    Memory Transistors}, volume={1}, DOI={<a href="https://doi.org/10.1002/admi.201400238">10.1002/admi.201400238</a>},
    journal={Advanced Materials Interfaces}, author={Khassanov, Artoem and Schmaltz,
    Thomas and Steinrück, Hans-Georg and Magerl, Andreas and Hirsch, Andreas and Halik,
    Marcus}, year={2014}, pages={1400238} }'
  chicago: 'Khassanov, Artoem, Thomas Schmaltz, Hans-Georg Steinrück, Andreas Magerl,
    Andreas Hirsch, and Marcus Halik. “Interface Engineering of Molecular Charge Storage
    Dielectric Layers for Organic Thin-Film Memory Transistors.” <i>Advanced Materials
    Interfaces</i> 1 (2014): 1400238. <a href="https://doi.org/10.1002/admi.201400238">https://doi.org/10.1002/admi.201400238</a>.'
  ieee: 'A. Khassanov, T. Schmaltz, H.-G. Steinrück, A. Magerl, A. Hirsch, and M.
    Halik, “Interface Engineering of Molecular Charge Storage Dielectric Layers for
    Organic Thin-Film Memory Transistors,” <i>Advanced Materials Interfaces</i>, vol.
    1, p. 1400238, 2014, doi: <a href="https://doi.org/10.1002/admi.201400238">10.1002/admi.201400238</a>.'
  mla: Khassanov, Artoem, et al. “Interface Engineering of Molecular Charge Storage
    Dielectric Layers for Organic Thin-Film Memory Transistors.” <i>Advanced Materials
    Interfaces</i>, vol. 1, 2014, p. 1400238, doi:<a href="https://doi.org/10.1002/admi.201400238">10.1002/admi.201400238</a>.
  short: A. Khassanov, T. Schmaltz, H.-G. Steinrück, A. Magerl, A. Hirsch, M. Halik,
    Advanced Materials Interfaces 1 (2014) 1400238.
date_created: 2021-09-01T09:48:56Z
date_updated: 2022-01-06T06:55:57Z
department:
- _id: '633'
doi: 10.1002/admi.201400238
intvolume: '         1'
language:
- iso: eng
page: '1400238'
publication: Advanced Materials Interfaces
publication_identifier:
  issn:
  - 2196-7350
publication_status: published
status: public
title: Interface Engineering of Molecular Charge Storage Dielectric Layers for Organic
  Thin-Film Memory Transistors
type: journal_article
user_id: '84268'
volume: 1
year: '2014'
...