{"publication":"Journal of Applied Physics","type":"journal_article","date_updated":"2022-01-06T06:55:57Z","page":"073508","doi":"10.1063/1.4792747","publication_status":"published","language":[{"iso":"eng"}],"date_created":"2021-09-01T09:49:28Z","citation":{"short":"J. Will, A. Gröschel, D. Kot, M.A. Schubert, C. Bergmann, H.-G. Steinrück, G. Kissinger, A. Magerl, Journal of Applied Physics 7 (2013) 073508.","chicago":"Will, J., A. Gröschel, D. Kot, M. A. Schubert, C. Bergmann, Hans-Georg Steinrück, G. Kissinger, and A. Magerl. “Oxygen Diffusivity in Silicon Derived from Dynamical X-Ray Diffraction.” Journal of Applied Physics 7 (2013): 073508. https://doi.org/10.1063/1.4792747.","bibtex":"@article{Will_Gröschel_Kot_Schubert_Bergmann_Steinrück_Kissinger_Magerl_2013, title={Oxygen diffusivity in silicon derived from dynamical X-ray diffraction}, volume={7}, DOI={10.1063/1.4792747}, journal={Journal of Applied Physics}, author={Will, J. and Gröschel, A. and Kot, D. and Schubert, M. A. and Bergmann, C. and Steinrück, Hans-Georg and Kissinger, G. and Magerl, A.}, year={2013}, pages={073508} }","apa":"Will, J., Gröschel, A., Kot, D., Schubert, M. A., Bergmann, C., Steinrück, H.-G., Kissinger, G., & Magerl, A. (2013). Oxygen diffusivity in silicon derived from dynamical X-ray diffraction. Journal of Applied Physics, 7, 073508. https://doi.org/10.1063/1.4792747","ama":"Will J, Gröschel A, Kot D, et al. Oxygen diffusivity in silicon derived from dynamical X-ray diffraction. Journal of Applied Physics. 2013;7:073508. doi:10.1063/1.4792747","mla":"Will, J., et al. “Oxygen Diffusivity in Silicon Derived from Dynamical X-Ray Diffraction.” Journal of Applied Physics, vol. 7, 2013, p. 073508, doi:10.1063/1.4792747.","ieee":"J. Will et al., “Oxygen diffusivity in silicon derived from dynamical X-ray diffraction,” Journal of Applied Physics, vol. 7, p. 073508, 2013, doi: 10.1063/1.4792747."},"user_id":"84268","volume":7,"publication_identifier":{"issn":["0021-8979","1089-7550"]},"department":[{"_id":"633"}],"title":"Oxygen diffusivity in silicon derived from dynamical X-ray diffraction","_id":"23643","author":[{"first_name":"J.","last_name":"Will","full_name":"Will, J."},{"first_name":"A.","full_name":"Gröschel, A.","last_name":"Gröschel"},{"full_name":"Kot, D.","last_name":"Kot","first_name":"D."},{"last_name":"Schubert","full_name":"Schubert, M. A.","first_name":"M. A."},{"first_name":"C.","last_name":"Bergmann","full_name":"Bergmann, C."},{"orcid":"0000-0001-6373-0877","first_name":"Hans-Georg","last_name":"Steinrück","id":"84268","full_name":"Steinrück, Hans-Georg"},{"first_name":"G.","full_name":"Kissinger, G.","last_name":"Kissinger"},{"full_name":"Magerl, A.","last_name":"Magerl","first_name":"A."}],"year":"2013","intvolume":" 7","status":"public"}