{"page":"073508","volume":7,"type":"journal_article","language":[{"iso":"eng"}],"status":"public","date_created":"2021-09-01T09:49:28Z","intvolume":" 7","_id":"23643","author":[{"first_name":"J.","full_name":"Will, J.","last_name":"Will"},{"last_name":"Gröschel","full_name":"Gröschel, A.","first_name":"A."},{"last_name":"Kot","full_name":"Kot, D.","first_name":"D."},{"last_name":"Schubert","full_name":"Schubert, M. A.","first_name":"M. A."},{"first_name":"C.","last_name":"Bergmann","full_name":"Bergmann, C."},{"orcid":"0000-0001-6373-0877","first_name":"Hans-Georg","id":"84268","full_name":"Steinrück, Hans-Georg","last_name":"Steinrück"},{"first_name":"G.","last_name":"Kissinger","full_name":"Kissinger, G."},{"first_name":"A.","full_name":"Magerl, A.","last_name":"Magerl"}],"date_updated":"2022-01-06T06:55:57Z","title":"Oxygen diffusivity in silicon derived from dynamical X-ray diffraction","publication_identifier":{"issn":["0021-8979","1089-7550"]},"citation":{"ieee":"J. Will et al., “Oxygen diffusivity in silicon derived from dynamical X-ray diffraction,” Journal of Applied Physics, vol. 7, p. 073508, 2013, doi: 10.1063/1.4792747.","ama":"Will J, Gröschel A, Kot D, et al. Oxygen diffusivity in silicon derived from dynamical X-ray diffraction. Journal of Applied Physics. 2013;7:073508. doi:10.1063/1.4792747","mla":"Will, J., et al. “Oxygen Diffusivity in Silicon Derived from Dynamical X-Ray Diffraction.” Journal of Applied Physics, vol. 7, 2013, p. 073508, doi:10.1063/1.4792747.","short":"J. Will, A. Gröschel, D. Kot, M.A. Schubert, C. Bergmann, H.-G. Steinrück, G. Kissinger, A. Magerl, Journal of Applied Physics 7 (2013) 073508.","apa":"Will, J., Gröschel, A., Kot, D., Schubert, M. A., Bergmann, C., Steinrück, H.-G., Kissinger, G., & Magerl, A. (2013). Oxygen diffusivity in silicon derived from dynamical X-ray diffraction. Journal of Applied Physics, 7, 073508. https://doi.org/10.1063/1.4792747","chicago":"Will, J., A. Gröschel, D. Kot, M. A. Schubert, C. Bergmann, Hans-Georg Steinrück, G. Kissinger, and A. Magerl. “Oxygen Diffusivity in Silicon Derived from Dynamical X-Ray Diffraction.” Journal of Applied Physics 7 (2013): 073508. https://doi.org/10.1063/1.4792747.","bibtex":"@article{Will_Gröschel_Kot_Schubert_Bergmann_Steinrück_Kissinger_Magerl_2013, title={Oxygen diffusivity in silicon derived from dynamical X-ray diffraction}, volume={7}, DOI={10.1063/1.4792747}, journal={Journal of Applied Physics}, author={Will, J. and Gröschel, A. and Kot, D. and Schubert, M. A. and Bergmann, C. and Steinrück, Hans-Georg and Kissinger, G. and Magerl, A.}, year={2013}, pages={073508} }"},"user_id":"84268","publication_status":"published","department":[{"_id":"633"}],"publication":"Journal of Applied Physics","doi":"10.1063/1.4792747","year":"2013"}