{"department":[{"_id":"15"}],"type":"journal_article","issue":"5","status":"public","_id":"29694","publication":"Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures","author":[{"full_name":"Thomas, A.","last_name":"Thomas","first_name":"A."},{"last_name":"Brückl","full_name":"Brückl, H.","first_name":"H."},{"id":"26883","full_name":"Sacher, Marc","last_name":"Sacher","first_name":"Marc","orcid":"0000-0001-6217-336X"},{"first_name":"J.","full_name":"Schmalhorst, J.","last_name":"Schmalhorst"},{"first_name":"G.","last_name":"Reiss","full_name":"Reiss, G."}],"keyword":["General Engineering"],"title":"Aluminum oxidation by a remote electron cyclotron resonance plasma in magnetic tunnel junctions","publication_identifier":{"issn":["0734-211X"]},"intvolume":"        21","language":[{"iso":"eng"}],"date_created":"2022-01-31T10:26:12Z","extern":"1","date_updated":"2024-04-23T12:14:43Z","publication_status":"published","doi":"10.1116/1.1609480","citation":{"ama":"Thomas A, Brückl H, Sacher M, Schmalhorst J, Reiss G. Aluminum oxidation by a remote electron cyclotron resonance plasma in magnetic tunnel junctions. <i>Journal of Vacuum Science &#38; Technology B: Microelectronics and Nanometer Structures</i>. 2003;21(5). doi:<a href=\"https://doi.org/10.1116/1.1609480\">10.1116/1.1609480</a>","short":"A. Thomas, H. Brückl, M. Sacher, J. Schmalhorst, G. Reiss, Journal of Vacuum Science &#38; Technology B: Microelectronics and Nanometer Structures 21 (2003).","chicago":"Thomas, A., H. Brückl, Marc Sacher, J. Schmalhorst, and G. Reiss. “Aluminum Oxidation by a Remote Electron Cyclotron Resonance Plasma in Magnetic Tunnel Junctions.” <i>Journal of Vacuum Science &#38; Technology B: Microelectronics and Nanometer Structures</i> 21, no. 5 (2003). <a href=\"https://doi.org/10.1116/1.1609480\">https://doi.org/10.1116/1.1609480</a>.","mla":"Thomas, A., et al. “Aluminum Oxidation by a Remote Electron Cyclotron Resonance Plasma in Magnetic Tunnel Junctions.” <i>Journal of Vacuum Science &#38; Technology B: Microelectronics and Nanometer Structures</i>, vol. 21, no. 5, 2120, American Vacuum Society, 2003, doi:<a href=\"https://doi.org/10.1116/1.1609480\">10.1116/1.1609480</a>.","bibtex":"@article{Thomas_Brückl_Sacher_Schmalhorst_Reiss_2003, title={Aluminum oxidation by a remote electron cyclotron resonance plasma in magnetic tunnel junctions}, volume={21}, DOI={<a href=\"https://doi.org/10.1116/1.1609480\">10.1116/1.1609480</a>}, number={52120}, journal={Journal of Vacuum Science &#38; Technology B: Microelectronics and Nanometer Structures}, publisher={American Vacuum Society}, author={Thomas, A. and Brückl, H. and Sacher, Marc and Schmalhorst, J. and Reiss, G.}, year={2003} }","apa":"Thomas, A., Brückl, H., Sacher, M., Schmalhorst, J., &#38; Reiss, G. (2003). Aluminum oxidation by a remote electron cyclotron resonance plasma in magnetic tunnel junctions. <i>Journal of Vacuum Science &#38; Technology B: Microelectronics and Nanometer Structures</i>, <i>21</i>(5), Article 2120. <a href=\"https://doi.org/10.1116/1.1609480\">https://doi.org/10.1116/1.1609480</a>","ieee":"A. Thomas, H. Brückl, M. Sacher, J. Schmalhorst, and G. Reiss, “Aluminum oxidation by a remote electron cyclotron resonance plasma in magnetic tunnel junctions,” <i>Journal of Vacuum Science &#38; Technology B: Microelectronics and Nanometer Structures</i>, vol. 21, no. 5, Art. no. 2120, 2003, doi: <a href=\"https://doi.org/10.1116/1.1609480\">10.1116/1.1609480</a>."},"publisher":"American Vacuum Society","article_number":"2120","volume":21,"user_id":"26883","year":"2003"}