{"_id":"29694","extern":"1","publication_identifier":{"issn":["0734-211X"]},"language":[{"iso":"eng"}],"doi":"10.1116/1.1609480","year":"2003","article_number":"2120","author":[{"first_name":"A.","full_name":"Thomas, A.","last_name":"Thomas"},{"first_name":"H.","last_name":"Brückl","full_name":"Brückl, H."},{"orcid":"0000-0001-6217-336X","first_name":"Marc","full_name":"Sacher, Marc","last_name":"Sacher","id":"26883"},{"first_name":"J.","full_name":"Schmalhorst, J.","last_name":"Schmalhorst"},{"first_name":"G.","full_name":"Reiss, G.","last_name":"Reiss"}],"keyword":["General Engineering"],"citation":{"apa":"Thomas, A., Brückl, H., Sacher, M., Schmalhorst, J., &#38; Reiss, G. (2003). Aluminum oxidation by a remote electron cyclotron resonance plasma in magnetic tunnel junctions. <i>Journal of Vacuum Science &#38; Technology B: Microelectronics and Nanometer Structures</i>, <i>21</i>(5), Article 2120. <a href=\"https://doi.org/10.1116/1.1609480\">https://doi.org/10.1116/1.1609480</a>","bibtex":"@article{Thomas_Brückl_Sacher_Schmalhorst_Reiss_2003, title={Aluminum oxidation by a remote electron cyclotron resonance plasma in magnetic tunnel junctions}, volume={21}, DOI={<a href=\"https://doi.org/10.1116/1.1609480\">10.1116/1.1609480</a>}, number={52120}, journal={Journal of Vacuum Science &#38; Technology B: Microelectronics and Nanometer Structures}, publisher={American Vacuum Society}, author={Thomas, A. and Brückl, H. and Sacher, Marc and Schmalhorst, J. and Reiss, G.}, year={2003} }","mla":"Thomas, A., et al. “Aluminum Oxidation by a Remote Electron Cyclotron Resonance Plasma in Magnetic Tunnel Junctions.” <i>Journal of Vacuum Science &#38; Technology B: Microelectronics and Nanometer Structures</i>, vol. 21, no. 5, 2120, American Vacuum Society, 2003, doi:<a href=\"https://doi.org/10.1116/1.1609480\">10.1116/1.1609480</a>.","ieee":"A. Thomas, H. Brückl, M. Sacher, J. Schmalhorst, and G. Reiss, “Aluminum oxidation by a remote electron cyclotron resonance plasma in magnetic tunnel junctions,” <i>Journal of Vacuum Science &#38; Technology B: Microelectronics and Nanometer Structures</i>, vol. 21, no. 5, Art. no. 2120, 2003, doi: <a href=\"https://doi.org/10.1116/1.1609480\">10.1116/1.1609480</a>.","short":"A. Thomas, H. Brückl, M. Sacher, J. Schmalhorst, G. Reiss, Journal of Vacuum Science &#38; Technology B: Microelectronics and Nanometer Structures 21 (2003).","ama":"Thomas A, Brückl H, Sacher M, Schmalhorst J, Reiss G. Aluminum oxidation by a remote electron cyclotron resonance plasma in magnetic tunnel junctions. <i>Journal of Vacuum Science &#38; Technology B: Microelectronics and Nanometer Structures</i>. 2003;21(5). doi:<a href=\"https://doi.org/10.1116/1.1609480\">10.1116/1.1609480</a>","chicago":"Thomas, A., H. Brückl, Marc Sacher, J. Schmalhorst, and G. Reiss. “Aluminum Oxidation by a Remote Electron Cyclotron Resonance Plasma in Magnetic Tunnel Junctions.” <i>Journal of Vacuum Science &#38; Technology B: Microelectronics and Nanometer Structures</i> 21, no. 5 (2003). <a href=\"https://doi.org/10.1116/1.1609480\">https://doi.org/10.1116/1.1609480</a>."},"issue":"5","intvolume":"        21","user_id":"26883","status":"public","date_created":"2022-01-31T10:26:12Z","publication":"Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures","date_updated":"2024-04-23T12:14:43Z","title":"Aluminum oxidation by a remote electron cyclotron resonance plasma in magnetic tunnel junctions","department":[{"_id":"15"}],"publisher":"American Vacuum Society","volume":21,"publication_status":"published","type":"journal_article"}