[{"intvolume":" 23","_id":"34645","issue":"10","article_number":"2100446","citation":{"chicago":"Tripathi, Tripurari Sharan, Martin Wilken, Christian Hoppe, Teresa de los Arcos, Guido Grundmeier, Anjana Devi, and Maarit Karppinen. “Atomic Layer Deposition of Copper Metal Films from Cu(Acac) 2 and Hydroquinone Reductant.” Advanced Engineering Materials 23, no. 10 (2021). https://doi.org/10.1002/adem.202100446.","apa":"Tripathi, T. S., Wilken, M., Hoppe, C., de los Arcos, T., Grundmeier, G., Devi, A., & Karppinen, M. (2021). Atomic Layer Deposition of Copper Metal Films from Cu(acac) 2 and Hydroquinone Reductant. Advanced Engineering Materials, 23(10), Article 2100446. https://doi.org/10.1002/adem.202100446","bibtex":"@article{Tripathi_Wilken_Hoppe_de los Arcos_Grundmeier_Devi_Karppinen_2021, title={Atomic Layer Deposition of Copper Metal Films from Cu(acac) 2 and Hydroquinone Reductant}, volume={23}, DOI={10.1002/adem.202100446}, number={102100446}, journal={Advanced Engineering Materials}, publisher={Wiley}, author={Tripathi, Tripurari Sharan and Wilken, Martin and Hoppe, Christian and de los Arcos, Teresa and Grundmeier, Guido and Devi, Anjana and Karppinen, Maarit}, year={2021} }","mla":"Tripathi, Tripurari Sharan, et al. “Atomic Layer Deposition of Copper Metal Films from Cu(Acac) 2 and Hydroquinone Reductant.” Advanced Engineering Materials, vol. 23, no. 10, 2100446, Wiley, 2021, doi:10.1002/adem.202100446.","short":"T.S. Tripathi, M. Wilken, C. Hoppe, T. de los Arcos, G. Grundmeier, A. Devi, M. Karppinen, Advanced Engineering Materials 23 (2021).","ieee":"T. S. Tripathi et al., “Atomic Layer Deposition of Copper Metal Films from Cu(acac) 2 and Hydroquinone Reductant,” Advanced Engineering Materials, vol. 23, no. 10, Art. no. 2100446, 2021, doi: 10.1002/adem.202100446."},"type":"journal_article","uri_base":"https://ris.uni-paderborn.de","user_id":"48864","author":[{"first_name":"Tripurari Sharan","last_name":"Tripathi"},{"last_name":"Wilken","first_name":"Martin"},{"first_name":"Christian","id":"27401","last_name":"Hoppe"},{"first_name":"Teresa","last_name":"de los Arcos"},{"id":"194","last_name":"Grundmeier","first_name":"Guido"},{"first_name":"Anjana","last_name":"Devi"},{"first_name":"Maarit","last_name":"Karppinen"}],"publication":"Advanced Engineering Materials","keyword":[],"status":"public","date_created":"2022-12-21T09:30:44Z","volume":23,"date_updated":"2022-12-21T09:31:52Z","creator":{"id":"48864","login":"adke"},"language":[{}],"dc":{"date":["2021"],"relation":["info:eu-repo/semantics/altIdentifier/doi/10.1002/adem.202100446","info:eu-repo/semantics/altIdentifier/issn/1438-1656","info:eu-repo/semantics/altIdentifier/issn/1527-2648"],"identifier":["https://ris.uni-paderborn.de/record/34645"],"title":["Atomic Layer Deposition of Copper Metal Films from Cu(acac) 2 and Hydroquinone Reductant"],"source":["Tripathi TS, Wilken M, Hoppe C, et al. Atomic Layer Deposition of Copper Metal Films from Cu(acac) 2 and Hydroquinone Reductant. Advanced Engineering Materials. 2021;23(10). doi:10.1002/adem.202100446"],"creator":["Tripathi, Tripurari Sharan","Wilken, Martin","Hoppe, Christian","de los Arcos, Teresa","Grundmeier, Guido","Devi, Anjana","Karppinen, Maarit"],"publisher":["Wiley"],"subject":["Condensed Matter Physics","General Materials Science"],"rights":["info:eu-repo/semantics/closedAccess"],"type":["info:eu-repo/semantics/article","doc-type:article","text","http://purl.org/coar/resource_type/c_6501"],"language":["eng"]},"department":[{"tree":[{"_id":"165"},{"_id":"2"},{"_id":"35"},{"_id":"44"},{"_id":"43"}],"_id":"302"}],"dini_type":"doc-type:article","publication_status":"published","publication_identifier":{"issn":[]}}]