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<titleInfo><title>Surface tension and its role for vertical wet etching of silicon</title></titleInfo>


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  <namePart type="given">F J Santos</namePart>
  <namePart type="family">Rodriguez</namePart>
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  <namePart type="given">Ulrich</namePart>
  <namePart type="family">Hilleringmann</namePart>
  <role><roleTerm type="text">author</roleTerm> </role><identifier type="local">20179</identifier></name>







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<originInfo><publisher>IOP Publishing</publisher><dateIssued encoding="w3cdtf">2012</dateIssued>
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<language><languageTerm authority="iso639-2b" type="code">eng</languageTerm>
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<subject><topic>Electrical and Electronic Engineering</topic><topic>Mechanical Engineering</topic><topic>Mechanics of Materials</topic><topic>Electronic</topic><topic>Optical and Magnetic Materials</topic>
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<relatedItem type="host"><titleInfo><title>Journal of Micromechanics and Microengineering</title></titleInfo>
  <identifier type="issn">0960-1317</identifier>
  <identifier type="issn">1361-6439</identifier><identifier type="doi">10.1088/0960-1317/22/12/125012</identifier>
<part><detail type="volume"><number>22</number></detail><detail type="issue"><number>12</number></detail>
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<short>A. Brockmeier, F.J.S. Rodriguez, M. Harrison, U. Hilleringmann, Journal of Micromechanics and Microengineering 22 (2012).</short>
<chicago>Brockmeier, A, F J Santos Rodriguez, M Harrison, and Ulrich Hilleringmann. “Surface Tension and Its Role for Vertical Wet Etching of Silicon.” &lt;i&gt;Journal of Micromechanics and Microengineering&lt;/i&gt; 22, no. 12 (2012). &lt;a href=&quot;https://doi.org/10.1088/0960-1317/22/12/125012&quot;&gt;https://doi.org/10.1088/0960-1317/22/12/125012&lt;/a&gt;.</chicago>
<ieee>A. Brockmeier, F. J. S. Rodriguez, M. Harrison, and U. Hilleringmann, “Surface tension and its role for vertical wet etching of silicon,” &lt;i&gt;Journal of Micromechanics and Microengineering&lt;/i&gt;, vol. 22, no. 12, Art. no. 125012, 2012, doi: &lt;a href=&quot;https://doi.org/10.1088/0960-1317/22/12/125012&quot;&gt;10.1088/0960-1317/22/12/125012&lt;/a&gt;.</ieee>
<apa>Brockmeier, A., Rodriguez, F. J. S., Harrison, M., &amp;#38; Hilleringmann, U. (2012). Surface tension and its role for vertical wet etching of silicon. &lt;i&gt;Journal of Micromechanics and Microengineering&lt;/i&gt;, &lt;i&gt;22&lt;/i&gt;(12), Article 125012. &lt;a href=&quot;https://doi.org/10.1088/0960-1317/22/12/125012&quot;&gt;https://doi.org/10.1088/0960-1317/22/12/125012&lt;/a&gt;</apa>
<bibtex>@article{Brockmeier_Rodriguez_Harrison_Hilleringmann_2012, title={Surface tension and its role for vertical wet etching of silicon}, volume={22}, DOI={&lt;a href=&quot;https://doi.org/10.1088/0960-1317/22/12/125012&quot;&gt;10.1088/0960-1317/22/12/125012&lt;/a&gt;}, number={12125012}, journal={Journal of Micromechanics and Microengineering}, publisher={IOP Publishing}, author={Brockmeier, A and Rodriguez, F J Santos and Harrison, M and Hilleringmann, Ulrich}, year={2012} }</bibtex>
<ama>Brockmeier A, Rodriguez FJS, Harrison M, Hilleringmann U. Surface tension and its role for vertical wet etching of silicon. &lt;i&gt;Journal of Micromechanics and Microengineering&lt;/i&gt;. 2012;22(12). doi:&lt;a href=&quot;https://doi.org/10.1088/0960-1317/22/12/125012&quot;&gt;10.1088/0960-1317/22/12/125012&lt;/a&gt;</ama>
<mla>Brockmeier, A., et al. “Surface Tension and Its Role for Vertical Wet Etching of Silicon.” &lt;i&gt;Journal of Micromechanics and Microengineering&lt;/i&gt;, vol. 22, no. 12, 125012, IOP Publishing, 2012, doi:&lt;a href=&quot;https://doi.org/10.1088/0960-1317/22/12/125012&quot;&gt;10.1088/0960-1317/22/12/125012&lt;/a&gt;.</mla>
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