@article{39877,
  author       = {{Hilleringmann, Ulrich and Vieregge, T. and Horstmann, J.T.}},
  issn         = {{0167-9317}},
  journal      = {{Microelectronic Engineering}},
  keywords     = {{Electrical and Electronic Engineering, Surfaces, Coatings and Films, Condensed Matter Physics, Atomic and Molecular Physics, and Optics, Electronic, Optical and Magnetic Materials}},
  number       = {{1-4}},
  pages        = {{569--572}},
  publisher    = {{Elsevier BV}},
  title        = {{{A structure definition technique for 25 nm lines of silicon and related materials}}},
  doi          = {{10.1016/s0167-9317(00)00380-4}},
  volume       = {{53}},
  year         = {{2002}},
}