{"publication":"IECON'99. Conference Proceedings. 25th Annual Conference of the IEEE Industrial Electronics Society (Cat. No.99CH37029)","_id":"39887","citation":{"chicago":"Hilleringmann, Ulrich, T. Vieregge, and J.T. Horstmann. “Masking and Etching of Silicon and Related Materials for Geometries down to 25 Nm.” In <i>IECON’99. Conference Proceedings. 25th Annual Conference of the IEEE Industrial Electronics Society (Cat. No.99CH37029)</i>. IEEE, 2003. <a href=\"https://doi.org/10.1109/iecon.1999.822171\">https://doi.org/10.1109/iecon.1999.822171</a>.","ieee":"U. Hilleringmann, T. Vieregge, and J. T. Horstmann, “Masking and etching of silicon and related materials for geometries down to 25 nm,” 2003, doi: <a href=\"https://doi.org/10.1109/iecon.1999.822171\">10.1109/iecon.1999.822171</a>.","apa":"Hilleringmann, U., Vieregge, T., &#38; Horstmann, J. T. (2003). Masking and etching of silicon and related materials for geometries down to 25 nm. <i>IECON’99. Conference Proceedings. 25th Annual Conference of the IEEE Industrial Electronics Society (Cat. No.99CH37029)</i>. <a href=\"https://doi.org/10.1109/iecon.1999.822171\">https://doi.org/10.1109/iecon.1999.822171</a>","bibtex":"@inproceedings{Hilleringmann_Vieregge_Horstmann_2003, title={Masking and etching of silicon and related materials for geometries down to 25 nm}, DOI={<a href=\"https://doi.org/10.1109/iecon.1999.822171\">10.1109/iecon.1999.822171</a>}, booktitle={IECON’99. Conference Proceedings. 25th Annual Conference of the IEEE Industrial Electronics Society (Cat. No.99CH37029)}, publisher={IEEE}, author={Hilleringmann, Ulrich and Vieregge, T. and Horstmann, J.T.}, year={2003} }","ama":"Hilleringmann U, Vieregge T, Horstmann JT. Masking and etching of silicon and related materials for geometries down to 25 nm. In: <i>IECON’99. Conference Proceedings. 25th Annual Conference of the IEEE Industrial Electronics Society (Cat. No.99CH37029)</i>. IEEE; 2003. doi:<a href=\"https://doi.org/10.1109/iecon.1999.822171\">10.1109/iecon.1999.822171</a>","short":"U. Hilleringmann, T. Vieregge, J.T. Horstmann, in: IECON’99. Conference Proceedings. 25th Annual Conference of the IEEE Industrial Electronics Society (Cat. No.99CH37029), IEEE, 2003.","mla":"Hilleringmann, Ulrich, et al. “Masking and Etching of Silicon and Related Materials for Geometries down to 25 Nm.” <i>IECON’99. Conference Proceedings. 25th Annual Conference of the IEEE Industrial Electronics Society (Cat. No.99CH37029)</i>, IEEE, 2003, doi:<a href=\"https://doi.org/10.1109/iecon.1999.822171\">10.1109/iecon.1999.822171</a>."},"date_created":"2023-01-25T09:12:16Z","status":"public","doi":"10.1109/iecon.1999.822171","date_updated":"2023-03-21T09:59:07Z","year":"2003","title":"Masking and etching of silicon and related materials for geometries down to 25 nm","user_id":"20179","language":[{"iso":"eng"}],"publisher":"IEEE","department":[{"_id":"59"}],"type":"conference","author":[{"first_name":"Ulrich","id":"20179","full_name":"Hilleringmann, Ulrich","last_name":"Hilleringmann"},{"first_name":"T.","last_name":"Vieregge","full_name":"Vieregge, T."},{"last_name":"Horstmann","full_name":"Horstmann, J.T.","first_name":"J.T."}],"publication_status":"published"}