Matching analysis of deposition defined 50-nm MOSFET's Horstmann, J.T. Hilleringmann, Ulrich Goser, K.F. Electrical and Electronic Engineering Electronic Optical and Magnetic Materials Institute of Electrical and Electronics Engineers (IEEE) 2002 info:eu-repo/semantics/article doc-type:article text http://purl.org/coar/resource_type/c_6501 https://ris.uni-paderborn.de/record/39891 Horstmann JT, Hilleringmann U, Goser KF. Matching analysis of deposition defined 50-nm MOSFET’s. <i>IEEE Transactions on Electron Devices</i>. 2002;45(1):299-306. doi:<a href="https://doi.org/10.1109/16.658845">10.1109/16.658845</a> eng info:eu-repo/semantics/altIdentifier/doi/10.1109/16.658845 info:eu-repo/semantics/altIdentifier/issn/0018-9383 info:eu-repo/semantics/closedAccess