{"status":"public","author":[{"last_name":"Horstmann","first_name":"J.T.","full_name":"Horstmann, J.T."},{"full_name":"Hilleringmann, Ulrich","id":"20179","first_name":"Ulrich","last_name":"Hilleringmann"},{"full_name":"Goser, K.F.","first_name":"K.F.","last_name":"Goser"}],"intvolume":"        45","page":"299-306","user_id":"20179","type":"journal_article","date_updated":"2023-03-21T09:58:01Z","title":"Matching analysis of deposition defined 50-nm MOSFET's","citation":{"bibtex":"@article{Horstmann_Hilleringmann_Goser_2002, title={Matching analysis of deposition defined 50-nm MOSFET’s}, volume={45}, DOI={<a href=\"https://doi.org/10.1109/16.658845\">10.1109/16.658845</a>}, number={1}, journal={IEEE Transactions on Electron Devices}, publisher={Institute of Electrical and Electronics Engineers (IEEE)}, author={Horstmann, J.T. and Hilleringmann, Ulrich and Goser, K.F.}, year={2002}, pages={299–306} }","short":"J.T. Horstmann, U. Hilleringmann, K.F. Goser, IEEE Transactions on Electron Devices 45 (2002) 299–306.","ieee":"J. T. Horstmann, U. Hilleringmann, and K. F. Goser, “Matching analysis of deposition defined 50-nm MOSFET’s,” <i>IEEE Transactions on Electron Devices</i>, vol. 45, no. 1, pp. 299–306, 2002, doi: <a href=\"https://doi.org/10.1109/16.658845\">10.1109/16.658845</a>.","chicago":"Horstmann, J.T., Ulrich Hilleringmann, and K.F. Goser. “Matching Analysis of Deposition Defined 50-Nm MOSFET’s.” <i>IEEE Transactions on Electron Devices</i> 45, no. 1 (2002): 299–306. <a href=\"https://doi.org/10.1109/16.658845\">https://doi.org/10.1109/16.658845</a>.","mla":"Horstmann, J. T., et al. “Matching Analysis of Deposition Defined 50-Nm MOSFET’s.” <i>IEEE Transactions on Electron Devices</i>, vol. 45, no. 1, Institute of Electrical and Electronics Engineers (IEEE), 2002, pp. 299–306, doi:<a href=\"https://doi.org/10.1109/16.658845\">10.1109/16.658845</a>.","apa":"Horstmann, J. T., Hilleringmann, U., &#38; Goser, K. F. (2002). Matching analysis of deposition defined 50-nm MOSFET’s. <i>IEEE Transactions on Electron Devices</i>, <i>45</i>(1), 299–306. <a href=\"https://doi.org/10.1109/16.658845\">https://doi.org/10.1109/16.658845</a>","ama":"Horstmann JT, Hilleringmann U, Goser KF. Matching analysis of deposition defined 50-nm MOSFET’s. <i>IEEE Transactions on Electron Devices</i>. 2002;45(1):299-306. doi:<a href=\"https://doi.org/10.1109/16.658845\">10.1109/16.658845</a>"},"publication_identifier":{"issn":["0018-9383"]},"language":[{"iso":"eng"}],"_id":"39891","year":"2002","publisher":"Institute of Electrical and Electronics Engineers (IEEE)","publication":"IEEE Transactions on Electron Devices","date_created":"2023-01-25T09:14:43Z","department":[{"_id":"59"}],"keyword":["Electrical and Electronic Engineering","Electronic","Optical and Magnetic Materials"],"doi":"10.1109/16.658845","publication_status":"published","volume":45,"issue":"1"}