{"date_created":"2018-08-21T11:44:47Z","language":[{"iso":"eng"}],"department":[{"_id":"286"},{"_id":"15"}],"author":[{"full_name":"Riedl, Thomas","id":"36950","last_name":"Riedl","first_name":"Thomas"},{"first_name":"Vinay","last_name":"Kunnathully","full_name":"Kunnathully, Vinay"},{"first_name":"Jörg","last_name":"Lindner","id":"20797","full_name":"Lindner, Jörg"}],"date_updated":"2022-01-06T07:00:05Z","status":"public","conference":{"start_date":"2017-05-22","location":"Straßburg (France)","end_date":"2017-05-26","name":"E-MRS Spring Meeting 2017"},"citation":{"bibtex":"@article{Riedl_Kunnathully_Lindner_2017, series={poster V.14.72}, title={Evolution of the opening size of nanosphere lithography masks during thermal annealing}, author={Riedl, Thomas and Kunnathully, Vinay and Lindner, Jörg}, year={2017}, collection={poster V.14.72} }","chicago":"Riedl, Thomas, Vinay Kunnathully, and Jörg Lindner. “Evolution of the Opening Size of Nanosphere Lithography Masks during Thermal Annealing.” Poster V.14.72, 2017.","ama":"Riedl T, Kunnathully V, Lindner J. Evolution of the opening size of nanosphere lithography masks during thermal annealing. 2017.","apa":"Riedl, T., Kunnathully, V., & Lindner, J. (2017). Evolution of the opening size of nanosphere lithography masks during thermal annealing. Presented at the E-MRS Spring Meeting 2017, Straßburg (France).","ieee":"T. Riedl, V. Kunnathully, and J. Lindner, “Evolution of the opening size of nanosphere lithography masks during thermal annealing.” 2017.","mla":"Riedl, Thomas, et al. Evolution of the Opening Size of Nanosphere Lithography Masks during Thermal Annealing. 2017.","short":"T. Riedl, V. Kunnathully, J. Lindner, (2017)."},"series_title":"poster V.14.72","year":"2017","user_id":"55706","type":"conference","title":"Evolution of the opening size of nanosphere lithography masks during thermal annealing","_id":"3991"}