{"user_id":"55706","series_title":"poster V.14.72","year":"2017","citation":{"ama":"Riedl T, Kunnathully V, Lindner J. Evolution of the opening size of nanosphere lithography masks during thermal annealing. 2017.","short":"T. Riedl, V. Kunnathully, J. Lindner, (2017).","apa":"Riedl, T., Kunnathully, V., &#38; Lindner, J. (2017). Evolution of the opening size of nanosphere lithography masks during thermal annealing. Presented at the E-MRS Spring Meeting 2017, Straßburg (France).","chicago":"Riedl, Thomas, Vinay Kunnathully, and Jörg Lindner. “Evolution of the Opening Size of Nanosphere Lithography Masks during Thermal Annealing.” Poster V.14.72, 2017.","ieee":"T. Riedl, V. Kunnathully, and J. Lindner, “Evolution of the opening size of nanosphere lithography masks during thermal annealing.” 2017.","mla":"Riedl, Thomas, et al. <i>Evolution of the Opening Size of Nanosphere Lithography Masks during Thermal Annealing</i>. 2017.","bibtex":"@article{Riedl_Kunnathully_Lindner_2017, series={poster V.14.72}, title={Evolution of the opening size of nanosphere lithography masks during thermal annealing}, author={Riedl, Thomas and Kunnathully, Vinay and Lindner, Jörg}, year={2017}, collection={poster V.14.72} }"},"title":"Evolution of the opening size of nanosphere lithography masks during thermal annealing","_id":"3991","type":"conference","conference":{"name":"E-MRS Spring Meeting 2017","location":"Straßburg (France)","end_date":"2017-05-26","start_date":"2017-05-22"},"date_updated":"2022-01-06T07:00:05Z","date_created":"2018-08-21T11:44:47Z","language":[{"iso":"eng"}],"department":[{"_id":"286"},{"_id":"15"}],"author":[{"first_name":"Thomas","id":"36950","full_name":"Riedl, Thomas","last_name":"Riedl"},{"first_name":"Vinay","last_name":"Kunnathully","full_name":"Kunnathully, Vinay"},{"full_name":"Lindner, Jörg","last_name":"Lindner","id":"20797","first_name":"Jörg"}],"status":"public"}