@article{39916,
  author       = {{Adams, S. and Hilleringmann, Ulrich and Goser, K.}},
  issn         = {{0167-9317}},
  journal      = {{Microelectronic Engineering}},
  keywords     = {{Electrical and Electronic Engineering, Surfaces, Coatings and Films, Condensed Matter Physics, Atomic and Molecular Physics, and Optics, Electronic, Optical and Magnetic Materials}},
  number       = {{1-4}},
  pages        = {{191--194}},
  publisher    = {{Elsevier BV}},
  title        = {{{CMOS compatible micromachining by dry silicon-etching techniques}}},
  doi          = {{10.1016/0167-9317(92)90420-v}},
  volume       = {{19}},
  year         = {{2002}},
}