{"language":[{"iso":"eng"}],"_id":"4011","year":"2016","conference":{"name":"E-MRS Fall Meeting 2016","end_date":"2016-09-22","location":"Warsaw (Poland)","start_date":"2016-09-19"},"date_updated":"2022-01-06T07:00:07Z","author":[{"full_name":"Riedl, Thomas","last_name":"Riedl","first_name":"Thomas","id":"36950"},{"full_name":"Lindner, Jörg","last_name":"Lindner","id":"20797","first_name":"Jörg"}],"status":"public","title":"Automated SEM image analysis of the opening size distribution of nanosphere lithography masks and their origins ","date_created":"2018-08-21T12:33:59Z","type":"conference","citation":{"bibtex":"@article{Riedl_Lindner_2016, series={contributed talk E.13.5}, title={Automated SEM image analysis of the opening size distribution of nanosphere lithography masks and their origins }, author={Riedl, Thomas and Lindner, Jörg}, year={2016}, collection={contributed talk E.13.5} }","ama":"Riedl T, Lindner J. Automated SEM image analysis of the opening size distribution of nanosphere lithography masks and their origins . 2016.","chicago":"Riedl, Thomas, and Jörg Lindner. “Automated SEM Image Analysis of the Opening Size Distribution of Nanosphere Lithography Masks and Their Origins .” Contributed Talk E.13.5, 2016.","short":"T. Riedl, J. Lindner, (2016).","ieee":"T. Riedl and J. Lindner, “Automated SEM image analysis of the opening size distribution of nanosphere lithography masks and their origins .” 2016.","apa":"Riedl, T., &#38; Lindner, J. (2016). Automated SEM image analysis of the opening size distribution of nanosphere lithography masks and their origins . Presented at the E-MRS Fall Meeting 2016, Warsaw (Poland).","mla":"Riedl, Thomas, and Jörg Lindner. <i>Automated SEM Image Analysis of the Opening Size Distribution of Nanosphere Lithography Masks and Their Origins </i>. 2016."},"user_id":"55706","department":[{"_id":"286"}],"series_title":"contributed talk E.13.5"}