{"series_title":"poster Mo-P-8","user_id":"55706","department":[{"_id":"286"},{"_id":"15"}],"_id":"4014","language":[{"iso":"eng"}],"type":"conference","status":"public","author":[{"first_name":"T.","full_name":"Rieger, T.","last_name":"Rieger"},{"last_name":"Riedl","id":"36950","full_name":"Riedl, Thomas","first_name":"Thomas"},{"first_name":"Jörg","last_name":"Lindner","id":"20797","full_name":"Lindner, Jörg"},{"full_name":"Pawlis, A.","last_name":"Pawlis","first_name":"A."}],"date_created":"2018-08-21T12:42:48Z","date_updated":"2022-01-06T07:00:07Z","conference":{"location":"Montpellier (France)","end_date":"2016-09-09","start_date":"2016-09-05","name":"19th International Conference on Molecular Beam Epitaxy"},"title":"Enhancement of the critical thickness of CdSe/ZnSe quantum wells via the strain compensation technique","citation":{"chicago":"Rieger, T., Thomas Riedl, Jörg Lindner, and A. Pawlis. “Enhancement of the Critical Thickness of CdSe/ZnSe Quantum Wells via the Strain Compensation Technique.” Poster Mo-P-8, 2016.","ieee":"T. Rieger, T. Riedl, J. Lindner, and A. Pawlis, “Enhancement of the critical thickness of CdSe/ZnSe quantum wells via the strain compensation technique.” 2016.","ama":"Rieger T, Riedl T, Lindner J, Pawlis A. Enhancement of the critical thickness of CdSe/ZnSe quantum wells via the strain compensation technique. 2016.","mla":"Rieger, T., et al. <i>Enhancement of the Critical Thickness of CdSe/ZnSe Quantum Wells via the Strain Compensation Technique</i>. 2016.","bibtex":"@article{Rieger_Riedl_Lindner_Pawlis_2016, series={poster Mo-P-8}, title={Enhancement of the critical thickness of CdSe/ZnSe quantum wells via the strain compensation technique}, author={Rieger, T. and Riedl, Thomas and Lindner, Jörg and Pawlis, A.}, year={2016}, collection={poster Mo-P-8} }","short":"T. Rieger, T. Riedl, J. Lindner, A. Pawlis, (2016).","apa":"Rieger, T., Riedl, T., Lindner, J., &#38; Pawlis, A. (2016). Enhancement of the critical thickness of CdSe/ZnSe quantum wells via the strain compensation technique. Presented at the 19th International Conference on Molecular Beam Epitaxy, Montpellier (France)."},"year":"2016"}