Nanoscale Surface Patterning of Silicon Using Local Swelling Induced by He Implantation through NSL-Masks

article Nanoscale Surface Patterning of Silicon Using Local Swelling Induced by He Implantation through NSL-Masks published Frederic J.C. Fischer author Michael Weinl author Jörg Lindner author 20797 Bernd Stritzker author 15 department 286 department MRS Spring Meeting 2009 A novel technique to form periodically nanostructured Si surface morphologies based on nanosphere lithography (NSL) and He ion implantation induced swelling is studied in detail. It is shown that by implantation of keV He ions through the nanometric openings of NSL masks regular arrays of hillocks and rings can be created on silicon surfaces. The shape and size of these surface features can be easily controlled by adjusting the ion dose and energy as well as the mask size. Feature heights of more than 100 nm can be obtained, while feature distances are typically 1.15 or 2 (hillock or ring) nanosphere radii, which are chosen to be between 100 and 500 nm in this study. Atomic force and scanning electron microscopy measurements of the surface morphology are supplemented by cross-sectional transmission electron microscopy, revealing the inner structure of hillocks to consist of a central cavity surrounded by a hierarchical arrangement of smaller voids. The surface morphologies developed here have the potential to be useful for fixing and separating nano-objects on a silicon surface. Cambridge University Press (CUP)2009San Franicsco (USA) eng MRS Proceedings 1946-427410.1557/proc-1181-dd10-02 1181 F.J.C. Fischer, M. Weinl, J. Lindner, B. Stritzker, MRS Proceedings 1181 (2009). Fischer, Frederic J.C., Michael Weinl, Jörg Lindner, and Bernd Stritzker. “Nanoscale Surface Patterning of Silicon Using Local Swelling Induced by He Implantation through NSL-Masks.” MRS Proceedings 1181 (2009). <a href="https://doi.org/10.1557/proc-1181-dd10-02">https://doi.org/10.1557/proc-1181-dd10-02</a>. F. J. C. Fischer, M. Weinl, J. Lindner, and B. Stritzker, “Nanoscale Surface Patterning of Silicon Using Local Swelling Induced by He Implantation through NSL-Masks,” MRS Proceedings, vol. 1181, 2009. Fischer, F. J. C., Weinl, M., Lindner, J., & Stritzker, B. (2009). Nanoscale Surface Patterning of Silicon Using Local Swelling Induced by He Implantation through NSL-Masks. MRS Proceedings, 1181. <a href="https://doi.org/10.1557/proc-1181-dd10-02">https://doi.org/10.1557/proc-1181-dd10-02</a> @article{Fischer_Weinl_Lindner_Stritzker_2009, title={Nanoscale Surface Patterning of Silicon Using Local Swelling Induced by He Implantation through NSL-Masks}, volume={1181}, DOI={<a href="https://doi.org/10.1557/proc-1181-dd10-02">10.1557/proc-1181-dd10-02</a>}, number={1181-DD10-02}, journal={MRS Proceedings}, publisher={Cambridge University Press (CUP)}, author={Fischer, Frederic J.C. and Weinl, Michael and Lindner, Jörg and Stritzker, Bernd}, year={2009} } Fischer FJC, Weinl M, Lindner J, Stritzker B. Nanoscale Surface Patterning of Silicon Using Local Swelling Induced by He Implantation through NSL-Masks. MRS Proceedings. 2009;1181. doi:<a href="https://doi.org/10.1557/proc-1181-dd10-02">10.1557/proc-1181-dd10-02</a> Fischer, Frederic J. C., et al. “Nanoscale Surface Patterning of Silicon Using Local Swelling Induced by He Implantation through NSL-Masks.” MRS Proceedings, vol. 1181, 1181-DD10-02, Cambridge University Press (CUP), 2009, doi:<a href="https://doi.org/10.1557/proc-1181-dd10-02">10.1557/proc-1181-dd10-02</a>. 41522018-08-27T13:21:44Z2022-01-06T07:00:26Z