{"citation":{"short":"E. Tschumak, R. Granzner, J. Lindner, F. Schwierz, K. Lischka, H. Nagasawa, M. Abe, D. As, Applied Physics Letters 96 (2010).","chicago":"Tschumak, E., R. Granzner, Jörg Lindner, F. Schwierz, K. Lischka, H. Nagasawa, M. Abe, and Donald As. “Nonpolar Cubic AlGaN/GaN Heterojunction Field-Effect Transistor on Ar+ Implanted 3C–SiC (001).” Applied Physics Letters 96, no. 25 (2010). https://doi.org/10.1063/1.3455066.","bibtex":"@article{Tschumak_Granzner_Lindner_Schwierz_Lischka_Nagasawa_Abe_As_2010, title={Nonpolar cubic AlGaN/GaN heterojunction field-effect transistor on Ar+ implanted 3C–SiC (001)}, volume={96}, DOI={10.1063/1.3455066}, number={25253501}, journal={Applied Physics Letters}, publisher={AIP Publishing}, author={Tschumak, E. and Granzner, R. and Lindner, Jörg and Schwierz, F. and Lischka, K. and Nagasawa, H. and Abe, M. and As, Donald}, year={2010} }","apa":"Tschumak, E., Granzner, R., Lindner, J., Schwierz, F., Lischka, K., Nagasawa, H., … As, D. (2010). Nonpolar cubic AlGaN/GaN heterojunction field-effect transistor on Ar+ implanted 3C–SiC (001). Applied Physics Letters, 96(25). https://doi.org/10.1063/1.3455066","ieee":"E. Tschumak et al., “Nonpolar cubic AlGaN/GaN heterojunction field-effect transistor on Ar+ implanted 3C–SiC (001),” Applied Physics Letters, vol. 96, no. 25, 2010.","mla":"Tschumak, E., et al. “Nonpolar Cubic AlGaN/GaN Heterojunction Field-Effect Transistor on Ar+ Implanted 3C–SiC (001).” Applied Physics Letters, vol. 96, no. 25, 253501, AIP Publishing, 2010, doi:10.1063/1.3455066.","ama":"Tschumak E, Granzner R, Lindner J, et al. Nonpolar cubic AlGaN/GaN heterojunction field-effect transistor on Ar+ implanted 3C–SiC (001). Applied Physics Letters. 2010;96(25). doi:10.1063/1.3455066"},"user_id":"55706","volume":96,"department":[{"_id":"15"},{"_id":"286"}],"publication_identifier":{"issn":["0003-6951","1077-3118"]},"_id":"4194","title":"Nonpolar cubic AlGaN/GaN heterojunction field-effect transistor on Ar+ implanted 3C–SiC (001)","author":[{"last_name":"Tschumak","full_name":"Tschumak, E.","first_name":"E."},{"first_name":"R.","last_name":"Granzner","full_name":"Granzner, R."},{"first_name":"Jörg","full_name":"Lindner, Jörg","id":"20797","last_name":"Lindner"},{"full_name":"Schwierz, F.","last_name":"Schwierz","first_name":"F."},{"first_name":"K.","full_name":"Lischka, K.","last_name":"Lischka"},{"last_name":"Nagasawa","full_name":"Nagasawa, H.","first_name":"H."},{"first_name":"M.","last_name":"Abe","full_name":"Abe, M."},{"last_name":"As","full_name":"As, Donald","first_name":"Donald"}],"publisher":"AIP Publishing","year":"2010","intvolume":" 96","status":"public","publication":"Applied Physics Letters","type":"journal_article","date_updated":"2022-01-06T07:00:33Z","article_type":"original","language":[{"iso":"eng"}],"date_created":"2018-08-28T11:56:08Z","file_date_updated":"2018-08-28T11:58:27Z","abstract":[{"text":"A heterojunction field-effect transistor (HFET) was fabricated of nonpolar cubic AlGaN/GaN grown on Ar+ implanted 3C–SiC (001) by molecular beam epitaxy. The device shows a clear field effect at positive bias voltages with V_th=0.6 V. The HFET output characteristics were calculated using ATLAS simulation program. The electron channel at the cubic AlGaN/GaN interface was detected by room temperature capacitance-voltage measurements.","lang":"eng"}],"has_accepted_license":"1","file":[{"file_name":"Non-polar cubic AlGaN-GaN HFET on Ar+ implanted 3C-SiC 001.pdf","file_id":"4195","success":1,"file_size":277385,"creator":"hclaudia","date_updated":"2018-08-28T11:58:27Z","date_created":"2018-08-28T11:58:27Z","relation":"main_file","content_type":"application/pdf","access_level":"closed"}],"article_number":"253501","doi":"10.1063/1.3455066","issue":"25","publication_status":"published","ddc":["530"]}