[{"status":"public","year":"2009","accept":"1","intvolume":"       267","volume":267,"file_date_updated":"2018-08-28T13:05:32Z","author":[{"first_name":"Jörg","id":"20797","last_name":"Lindner","full_name":"Lindner, Jörg"},{"last_name":"Seider","full_name":"Seider, C.","first_name":"C."},{"first_name":"F.","last_name":"Fischer","full_name":"Fischer, F."},{"first_name":"M.","full_name":"Weinl, M.","last_name":"Weinl"},{"full_name":"Stritzker, B.","last_name":"Stritzker","first_name":"B."}],"citation":{"ieee":"J. Lindner, C. Seider, F. Fischer, M. Weinl, and B. Stritzker, “Regular surface patterns by local swelling induced by He implantation into silicon through nanosphere lithography masks,” <i>Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms</i>, vol. 267, no. 8–9, pp. 1394–1397, 2009.","chicago":"Lindner, Jörg, C. Seider, F. Fischer, M. Weinl, and B. Stritzker. “Regular Surface Patterns by Local Swelling Induced by He Implantation into Silicon through Nanosphere Lithography Masks.” <i>Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms</i> 267, no. 8–9 (2009): 1394–97. <a href=\"https://doi.org/10.1016/j.nimb.2009.01.052\">https://doi.org/10.1016/j.nimb.2009.01.052</a>.","bibtex":"@article{Lindner_Seider_Fischer_Weinl_Stritzker_2009, title={Regular surface patterns by local swelling induced by He implantation into silicon through nanosphere lithography masks}, volume={267}, DOI={<a href=\"https://doi.org/10.1016/j.nimb.2009.01.052\">10.1016/j.nimb.2009.01.052</a>}, number={8–9}, journal={Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms}, publisher={Elsevier BV}, author={Lindner, Jörg and Seider, C. and Fischer, F. and Weinl, M. and Stritzker, B.}, year={2009}, pages={1394–1397} }","short":"J. Lindner, C. Seider, F. Fischer, M. Weinl, B. Stritzker, Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms 267 (2009) 1394–1397.","ama":"Lindner J, Seider C, Fischer F, Weinl M, Stritzker B. Regular surface patterns by local swelling induced by He implantation into silicon through nanosphere lithography masks. <i>Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms</i>. 2009;267(8-9):1394-1397. doi:<a href=\"https://doi.org/10.1016/j.nimb.2009.01.052\">10.1016/j.nimb.2009.01.052</a>","apa":"Lindner, J., Seider, C., Fischer, F., Weinl, M., &#38; Stritzker, B. (2009). Regular surface patterns by local swelling induced by He implantation into silicon through nanosphere lithography masks. <i>Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms</i>, <i>267</i>(8–9), 1394–1397. <a href=\"https://doi.org/10.1016/j.nimb.2009.01.052\">https://doi.org/10.1016/j.nimb.2009.01.052</a>","mla":"Lindner, Jörg, et al. “Regular Surface Patterns by Local Swelling Induced by He Implantation into Silicon through Nanosphere Lithography Masks.” <i>Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms</i>, vol. 267, no. 8–9, Elsevier BV, 2009, pp. 1394–97, doi:<a href=\"https://doi.org/10.1016/j.nimb.2009.01.052\">10.1016/j.nimb.2009.01.052</a>."},"_id":"4221","type":"journal_article","extern":"1","language":[{"iso":"eng"}],"issue":"8-9","title":"Regular surface patterns by local swelling induced by He implantation into silicon through nanosphere lithography masks","user_id":"55706","article_type":"original","ddc":["530"],"date_created":"2018-08-28T13:04:23Z","page":"1394-1397","date_updated":"2019-01-03T13:15:29Z","abstract":[{"text":"Nanopatterning of silicon surfaces by means of He+ ion implantation through self-organized colloidal\r\nmasks is reported for the first time. Nanosphere lithography (NSL) masks with mask openings of 46–\r\n230 nm width were deposited on Si(100) wafers. He+ ions were implanted through these masks in order\r\nto induce a local cavity formation and Si surface swelling. The surface morphology and the subsurface\r\nstructure were studied using atomic force microscopy (AFM) and cross-sectional transmission electron\r\nmicroscopy (XTEM), respectively, as a function of mask and implantation parameters. It is demonstrated\r\nthat regular arrays of both individual hillocks and trough-like circular rings can be generated.","lang":"eng"}],"publication_status":"published","publication":"Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms","publication_identifier":{"issn":["0168-583X"]},"publisher":"Elsevier BV","doi":"10.1016/j.nimb.2009.01.052","file":[{"file_name":"Regular Silicon Surface Patterns by Local Swelling Induced by He Implantation through Nanosphere Lithography Masks.pdf","creator":"hclaudia","open_access":1,"access_level":"closed","relation":"main_file","date_created":"2018-08-28T13:05:32Z","file_id":"4222","file_size":467219,"success":1,"date_updated":"2018-08-28T13:05:32Z","content_type":"application/pdf"}]}]