{"file":[{"access_level":"closed","date_created":"2018-08-28T13:05:32Z","creator":"hclaudia","file_id":"4222","relation":"main_file","file_size":467219,"file_name":"Regular Silicon Surface Patterns by Local Swelling Induced by He Implantation through Nanosphere Lithography Masks.pdf","success":1,"content_type":"application/pdf","date_updated":"2018-08-28T13:05:32Z"}],"date_updated":"2022-01-06T07:00:38Z","file_date_updated":"2018-08-28T13:05:32Z","ddc":["530"],"language":[{"iso":"eng"}],"title":"Regular surface patterns by local swelling induced by He implantation into silicon through nanosphere lithography masks","year":"2009","intvolume":" 267","page":"1394-1397","volume":267,"status":"public","_id":"4221","type":"journal_article","publisher":"Elsevier BV","publication":"Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms","publication_status":"published","user_id":"55706","citation":{"chicago":"Lindner, Jörg, C. Seider, F. Fischer, M. Weinl, and B. Stritzker. “Regular Surface Patterns by Local Swelling Induced by He Implantation into Silicon through Nanosphere Lithography Masks.” Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms 267, no. 8–9 (2009): 1394–97. https://doi.org/10.1016/j.nimb.2009.01.052.","ieee":"J. Lindner, C. Seider, F. Fischer, M. Weinl, and B. Stritzker, “Regular surface patterns by local swelling induced by He implantation into silicon through nanosphere lithography masks,” Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, vol. 267, no. 8–9, pp. 1394–1397, 2009.","bibtex":"@article{Lindner_Seider_Fischer_Weinl_Stritzker_2009, title={Regular surface patterns by local swelling induced by He implantation into silicon through nanosphere lithography masks}, volume={267}, DOI={10.1016/j.nimb.2009.01.052}, number={8–9}, journal={Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms}, publisher={Elsevier BV}, author={Lindner, Jörg and Seider, C. and Fischer, F. and Weinl, M. and Stritzker, B.}, year={2009}, pages={1394–1397} }","apa":"Lindner, J., Seider, C., Fischer, F., Weinl, M., & Stritzker, B. (2009). Regular surface patterns by local swelling induced by He implantation into silicon through nanosphere lithography masks. Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 267(8–9), 1394–1397. https://doi.org/10.1016/j.nimb.2009.01.052","mla":"Lindner, Jörg, et al. “Regular Surface Patterns by Local Swelling Induced by He Implantation into Silicon through Nanosphere Lithography Masks.” Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, vol. 267, no. 8–9, Elsevier BV, 2009, pp. 1394–97, doi:10.1016/j.nimb.2009.01.052.","ama":"Lindner J, Seider C, Fischer F, Weinl M, Stritzker B. Regular surface patterns by local swelling induced by He implantation into silicon through nanosphere lithography masks. Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms. 2009;267(8-9):1394-1397. doi:10.1016/j.nimb.2009.01.052","short":"J. Lindner, C. Seider, F. Fischer, M. Weinl, B. Stritzker, Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms 267 (2009) 1394–1397."},"publication_identifier":{"issn":["0168-583X"]},"issue":"8-9","article_type":"original","author":[{"id":"20797","last_name":"Lindner","full_name":"Lindner, Jörg","first_name":"Jörg"},{"first_name":"C.","full_name":"Seider, C.","last_name":"Seider"},{"first_name":"F.","full_name":"Fischer, F.","last_name":"Fischer"},{"first_name":"M.","full_name":"Weinl, M.","last_name":"Weinl"},{"last_name":"Stritzker","first_name":"B.","full_name":"Stritzker, B."}],"date_created":"2018-08-28T13:04:23Z","has_accepted_license":"1","extern":"1","abstract":[{"text":"Nanopatterning of silicon surfaces by means of He+ ion implantation through self-organized colloidal\r\nmasks is reported for the first time. Nanosphere lithography (NSL) masks with mask openings of 46–\r\n230 nm width were deposited on Si(100) wafers. He+ ions were implanted through these masks in order\r\nto induce a local cavity formation and Si surface swelling. The surface morphology and the subsurface\r\nstructure were studied using atomic force microscopy (AFM) and cross-sectional transmission electron\r\nmicroscopy (XTEM), respectively, as a function of mask and implantation parameters. It is demonstrated\r\nthat regular arrays of both individual hillocks and trough-like circular rings can be generated.","lang":"eng"}],"doi":"10.1016/j.nimb.2009.01.052"}