{"year":"2018","user_id":"55706","department":[{"_id":"15"},{"_id":"286"}],"author":[{"first_name":"Katharina","id":"11305","full_name":"Brassat, Katharina","last_name":"Brassat"},{"last_name":"Kool","full_name":"Kool, Daniel","first_name":"Daniel","id":"44586"},{"first_name":"Jörg","id":"20797","last_name":"Lindner","full_name":"Lindner, Jörg"}],"publication_status":"draft","language":[{"iso":"eng"}],"_id":"4444","title":"Modification of block copolymer lithography masks by O2 plasma treatment: Insights from lift off experiments, nanopore etching and free membranes","publication":"To be submitted","date_updated":"2022-01-06T07:01:04Z","citation":{"ama":"Brassat K, Kool D, Lindner J. Modification of block copolymer lithography masks by O2 plasma treatment: Insights from lift off experiments, nanopore etching and free membranes. <i>To be submitted</i>.","bibtex":"@article{Brassat_Kool_Lindner, title={Modification of block copolymer lithography masks by O2 plasma treatment: Insights from lift off experiments, nanopore etching and free membranes}, journal={To be submitted}, author={Brassat, Katharina and Kool, Daniel and Lindner, Jörg} }","mla":"Brassat, Katharina, et al. “Modification of Block Copolymer Lithography Masks by O2 Plasma Treatment: Insights from Lift off Experiments, Nanopore Etching and Free Membranes.” <i>To Be Submitted</i>.","short":"K. Brassat, D. Kool, J. Lindner, To Be Submitted (n.d.).","chicago":"Brassat, Katharina, Daniel Kool, and Jörg Lindner. “Modification of Block Copolymer Lithography Masks by O2 Plasma Treatment: Insights from Lift off Experiments, Nanopore Etching and Free Membranes.” <i>To Be Submitted</i>, n.d.","apa":"Brassat, K., Kool, D., &#38; Lindner, J. (n.d.). Modification of block copolymer lithography masks by O2 plasma treatment: Insights from lift off experiments, nanopore etching and free membranes. <i>To Be Submitted</i>.","ieee":"K. Brassat, D. Kool, and J. Lindner, “Modification of block copolymer lithography masks by O2 plasma treatment: Insights from lift off experiments, nanopore etching and free membranes,” <i>To be submitted</i>."},"type":"journal_article","status":"public","date_created":"2018-09-18T11:42:30Z"}