{"publication_identifier":{"issn":["0021-8979","1089-7550"]},"volume":129,"issue":"1","author":[{"full_name":"Zhang, Dawei","last_name":"Zhang","first_name":"Dawei"},{"full_name":"Sando, Daniel","last_name":"Sando","first_name":"Daniel"},{"last_name":"Pan","full_name":"Pan, Ying","first_name":"Ying","id":"100383"},{"full_name":"Sharma, Pankaj","last_name":"Sharma","first_name":"Pankaj"},{"last_name":"Seidel","full_name":"Seidel, Jan","first_name":"Jan"}],"article_number":"014102","publisher":"AIP Publishing","publication":"Journal of Applied Physics","citation":{"ama":"Zhang D, Sando D, Pan Y, Sharma P, Seidel J. Robust ferroelectric polarization retention in harsh environments through engineered domain wall pinning. <i>Journal of Applied Physics</i>. 2021;129(1). doi:<a href=\"https://doi.org/10.1063/5.0029620\">10.1063/5.0029620</a>","short":"D. Zhang, D. Sando, Y. Pan, P. Sharma, J. Seidel, Journal of Applied Physics 129 (2021).","chicago":"Zhang, Dawei, Daniel Sando, Ying Pan, Pankaj Sharma, and Jan Seidel. “Robust Ferroelectric Polarization Retention in Harsh Environments through Engineered Domain Wall Pinning.” <i>Journal of Applied Physics</i> 129, no. 1 (2021). <a href=\"https://doi.org/10.1063/5.0029620\">https://doi.org/10.1063/5.0029620</a>.","ieee":"D. Zhang, D. Sando, Y. Pan, P. Sharma, and J. Seidel, “Robust ferroelectric polarization retention in harsh environments through engineered domain wall pinning,” <i>Journal of Applied Physics</i>, vol. 129, no. 1, Art. no. 014102, 2021, doi: <a href=\"https://doi.org/10.1063/5.0029620\">10.1063/5.0029620</a>.","apa":"Zhang, D., Sando, D., Pan, Y., Sharma, P., &#38; Seidel, J. (2021). Robust ferroelectric polarization retention in harsh environments through engineered domain wall pinning. <i>Journal of Applied Physics</i>, <i>129</i>(1), Article 014102. <a href=\"https://doi.org/10.1063/5.0029620\">https://doi.org/10.1063/5.0029620</a>","bibtex":"@article{Zhang_Sando_Pan_Sharma_Seidel_2021, title={Robust ferroelectric polarization retention in harsh environments through engineered domain wall pinning}, volume={129}, DOI={<a href=\"https://doi.org/10.1063/5.0029620\">10.1063/5.0029620</a>}, number={1014102}, journal={Journal of Applied Physics}, publisher={AIP Publishing}, author={Zhang, Dawei and Sando, Daniel and Pan, Ying and Sharma, Pankaj and Seidel, Jan}, year={2021} }","mla":"Zhang, Dawei, et al. “Robust Ferroelectric Polarization Retention in Harsh Environments through Engineered Domain Wall Pinning.” <i>Journal of Applied Physics</i>, vol. 129, no. 1, 014102, AIP Publishing, 2021, doi:<a href=\"https://doi.org/10.1063/5.0029620\">10.1063/5.0029620</a>."},"doi":"10.1063/5.0029620","extern":"1","year":"2021","title":"Robust ferroelectric polarization retention in harsh environments through engineered domain wall pinning","keyword":["General Physics and Astronomy"],"publication_status":"published","user_id":"100383","language":[{"iso":"eng"}],"type":"journal_article","intvolume":"       129","_id":"46011","status":"public","date_updated":"2023-07-11T16:39:06Z","date_created":"2023-07-11T14:50:35Z"}