{"date_updated":"2023-07-11T16:39:06Z","intvolume":"       129","issue":"1","extern":"1","title":"Robust ferroelectric polarization retention in harsh environments through engineered domain wall pinning","author":[{"full_name":"Zhang, Dawei","last_name":"Zhang","first_name":"Dawei"},{"first_name":"Daniel","last_name":"Sando","full_name":"Sando, Daniel"},{"full_name":"Pan, Ying","last_name":"Pan","first_name":"Ying","id":"100383"},{"full_name":"Sharma, Pankaj","last_name":"Sharma","first_name":"Pankaj"},{"last_name":"Seidel","full_name":"Seidel, Jan","first_name":"Jan"}],"publication_identifier":{"issn":["0021-8979","1089-7550"]},"doi":"10.1063/5.0029620","date_created":"2023-07-11T14:50:35Z","publication_status":"published","volume":129,"language":[{"iso":"eng"}],"publication":"Journal of Applied Physics","year":"2021","user_id":"100383","_id":"46011","status":"public","publisher":"AIP Publishing","keyword":["General Physics and Astronomy"],"type":"journal_article","article_number":"014102","citation":{"chicago":"Zhang, Dawei, Daniel Sando, Ying Pan, Pankaj Sharma, and Jan Seidel. “Robust Ferroelectric Polarization Retention in Harsh Environments through Engineered Domain Wall Pinning.” <i>Journal of Applied Physics</i> 129, no. 1 (2021). <a href=\"https://doi.org/10.1063/5.0029620\">https://doi.org/10.1063/5.0029620</a>.","mla":"Zhang, Dawei, et al. “Robust Ferroelectric Polarization Retention in Harsh Environments through Engineered Domain Wall Pinning.” <i>Journal of Applied Physics</i>, vol. 129, no. 1, 014102, AIP Publishing, 2021, doi:<a href=\"https://doi.org/10.1063/5.0029620\">10.1063/5.0029620</a>.","apa":"Zhang, D., Sando, D., Pan, Y., Sharma, P., &#38; Seidel, J. (2021). Robust ferroelectric polarization retention in harsh environments through engineered domain wall pinning. <i>Journal of Applied Physics</i>, <i>129</i>(1), Article 014102. <a href=\"https://doi.org/10.1063/5.0029620\">https://doi.org/10.1063/5.0029620</a>","short":"D. Zhang, D. Sando, Y. Pan, P. Sharma, J. Seidel, Journal of Applied Physics 129 (2021).","ieee":"D. Zhang, D. Sando, Y. Pan, P. Sharma, and J. Seidel, “Robust ferroelectric polarization retention in harsh environments through engineered domain wall pinning,” <i>Journal of Applied Physics</i>, vol. 129, no. 1, Art. no. 014102, 2021, doi: <a href=\"https://doi.org/10.1063/5.0029620\">10.1063/5.0029620</a>.","bibtex":"@article{Zhang_Sando_Pan_Sharma_Seidel_2021, title={Robust ferroelectric polarization retention in harsh environments through engineered domain wall pinning}, volume={129}, DOI={<a href=\"https://doi.org/10.1063/5.0029620\">10.1063/5.0029620</a>}, number={1014102}, journal={Journal of Applied Physics}, publisher={AIP Publishing}, author={Zhang, Dawei and Sando, Daniel and Pan, Ying and Sharma, Pankaj and Seidel, Jan}, year={2021} }","ama":"Zhang D, Sando D, Pan Y, Sharma P, Seidel J. Robust ferroelectric polarization retention in harsh environments through engineered domain wall pinning. <i>Journal of Applied Physics</i>. 2021;129(1). doi:<a href=\"https://doi.org/10.1063/5.0029620\">10.1063/5.0029620</a>"}}