[{"author":[{"first_name":"Hendrik","last_name":"Müller","full_name":"Müller, Hendrik"},{"first_name":"Hartmut","last_name":"Stadler","full_name":"Stadler, Hartmut"},{"id":"54556","full_name":"de los Arcos de Pedro, Maria Teresa","last_name":"de los Arcos de Pedro","first_name":"Maria Teresa","orcid":"0000-0002-8684-273X "},{"full_name":"Keller, Adrian","last_name":"Keller","orcid":"0000-0001-7139-3110","first_name":"Adrian","id":"48864"},{"id":"194","full_name":"Grundmeier, Guido","first_name":"Guido","last_name":"Grundmeier"}],"publication_identifier":{"issn":["2190-4286"]},"status":"public","title":"AFM-IR investigation of thin PECVD SiO x films on a polypropylene substrate in the surface-sensitive mode","year":"2024","intvolume":"        15","date_updated":"2025-02-12T14:56:14Z","_id":"58611","language":[{"iso":"eng"}],"page":"603–611","volume":15,"user_id":"54556","doi":"10.3762/bjnano.15.51","citation":{"short":"H. Müller, H. Stadler, M.T. de los Arcos de Pedro, A. Keller, G. Grundmeier, Beilstein Journal of Nanotechnology 15 (2024) 603–611.","chicago":"Müller, Hendrik, Hartmut Stadler, Maria Teresa de los Arcos de Pedro, Adrian Keller, and Guido Grundmeier. “AFM-IR Investigation of Thin PECVD SiO x Films on a Polypropylene Substrate in the Surface-Sensitive Mode.” <i>Beilstein Journal of Nanotechnology</i> 15, no. 1 (2024): 603–611. <a href=\"https://doi.org/10.3762/bjnano.15.51\">https://doi.org/10.3762/bjnano.15.51</a>.","apa":"Müller, H., Stadler, H., de los Arcos de Pedro, M. T., Keller, A., &#38; Grundmeier, G. (2024). AFM-IR investigation of thin PECVD SiO x films on a polypropylene substrate in the surface-sensitive mode. <i>Beilstein Journal of Nanotechnology</i>, <i>15</i>(1), 603–611. <a href=\"https://doi.org/10.3762/bjnano.15.51\">https://doi.org/10.3762/bjnano.15.51</a>","ieee":"H. Müller, H. Stadler, M. T. de los Arcos de Pedro, A. Keller, and G. Grundmeier, “AFM-IR investigation of thin PECVD SiO x films on a polypropylene substrate in the surface-sensitive mode,” <i>Beilstein Journal of Nanotechnology</i>, vol. 15, no. 1, pp. 603–611, 2024, doi: <a href=\"https://doi.org/10.3762/bjnano.15.51\">10.3762/bjnano.15.51</a>.","ama":"Müller H, Stadler H, de los Arcos de Pedro MT, Keller A, Grundmeier G. AFM-IR investigation of thin PECVD SiO x films on a polypropylene substrate in the surface-sensitive mode. <i>Beilstein Journal of Nanotechnology</i>. 2024;15(1):603–611. doi:<a href=\"https://doi.org/10.3762/bjnano.15.51\">10.3762/bjnano.15.51</a>","bibtex":"@article{Müller_Stadler_de los Arcos de Pedro_Keller_Grundmeier_2024, title={AFM-IR investigation of thin PECVD SiO x films on a polypropylene substrate in the surface-sensitive mode}, volume={15}, DOI={<a href=\"https://doi.org/10.3762/bjnano.15.51\">10.3762/bjnano.15.51</a>}, number={1}, journal={Beilstein Journal of Nanotechnology}, author={Müller, Hendrik and Stadler, Hartmut and de los Arcos de Pedro, Maria Teresa and Keller, Adrian and Grundmeier, Guido}, year={2024}, pages={603–611} }","mla":"Müller, Hendrik, et al. “AFM-IR Investigation of Thin PECVD SiO x Films on a Polypropylene Substrate in the Surface-Sensitive Mode.” <i>Beilstein Journal of Nanotechnology</i>, vol. 15, no. 1, 2024, pp. 603–611, doi:<a href=\"https://doi.org/10.3762/bjnano.15.51\">10.3762/bjnano.15.51</a>."},"publication":"Beilstein Journal of Nanotechnology","issue":"1","abstract":[{"lang":"eng","text":"AFM-IR investigation of thin PECVD SiOx films on a polypropylene substrate in the surface-sensitive mode"}],"date_created":"2025-02-12T14:48:49Z","department":[{"_id":"302"}],"type":"journal_article"}]