{"date_updated":"2026-04-01T08:43:03Z","oa":"1","date_created":"2026-04-01T08:39:55Z","author":[{"full_name":"Qudsia, Syeda","last_name":"Qudsia","first_name":"Syeda"},{"full_name":"Weiss, Alexander","last_name":"Weiss","first_name":"Alexander"},{"last_name":"Sirkiä","full_name":"Sirkiä, Saara","first_name":"Saara"},{"last_name":"Wang","full_name":"Wang, Fuzeng","first_name":"Fuzeng"},{"full_name":"Rosqvist, Emil","last_name":"Rosqvist","first_name":"Emil"},{"full_name":"Los Arcos, Teresa De","last_name":"Los Arcos","first_name":"Teresa De"},{"full_name":"Weinberger, Christian","last_name":"Weinberger","first_name":"Christian"},{"first_name":"Janne","last_name":"Halme","full_name":"Halme, Janne"},{"first_name":"Marianna","full_name":"Kemell, Marianna","last_name":"Kemell"},{"first_name":"Jan-Henrik","full_name":"Smått, Jan-Henrik","last_name":"Smått"}],"title":"Influence of deposition temperature and thickness of ALD-TiO2 on planar perovskite solar cell performance","doi":"https://doi.org/10.1016/j.apsusc.2026.166755","main_file_link":[{"url":"https://www.sciencedirect.com/science/article/pii/S0169433226009591?via%3Dihub","open_access":"1"}],"publication_identifier":{"issn":["0169-4332"]},"year":"2026","page":"166755","citation":{"ama":"Qudsia S, Weiss A, Sirkiä S, et al. Influence of deposition temperature and thickness of ALD-TiO2 on planar perovskite solar cell performance. Applied Surface Science. Published online 2026:166755. doi:https://doi.org/10.1016/j.apsusc.2026.166755","ieee":"S. Qudsia et al., “Influence of deposition temperature and thickness of ALD-TiO2 on planar perovskite solar cell performance,” Applied Surface Science, p. 166755, 2026, doi: https://doi.org/10.1016/j.apsusc.2026.166755.","chicago":"Qudsia, Syeda, Alexander Weiss, Saara Sirkiä, Fuzeng Wang, Emil Rosqvist, Teresa De Los Arcos, Christian Weinberger, Janne Halme, Marianna Kemell, and Jan-Henrik Smått. “Influence of Deposition Temperature and Thickness of ALD-TiO2 on Planar Perovskite Solar Cell Performance.” Applied Surface Science, 2026, 166755. https://doi.org/10.1016/j.apsusc.2026.166755.","apa":"Qudsia, S., Weiss, A., Sirkiä, S., Wang, F., Rosqvist, E., Los Arcos, T. D., Weinberger, C., Halme, J., Kemell, M., & Smått, J.-H. (2026). Influence of deposition temperature and thickness of ALD-TiO2 on planar perovskite solar cell performance. Applied Surface Science, 166755. https://doi.org/10.1016/j.apsusc.2026.166755","bibtex":"@article{Qudsia_Weiss_Sirkiä_Wang_Rosqvist_Los Arcos_Weinberger_Halme_Kemell_Smått_2026, title={Influence of deposition temperature and thickness of ALD-TiO2 on planar perovskite solar cell performance}, DOI={https://doi.org/10.1016/j.apsusc.2026.166755}, journal={Applied Surface Science}, author={Qudsia, Syeda and Weiss, Alexander and Sirkiä, Saara and Wang, Fuzeng and Rosqvist, Emil and Los Arcos, Teresa De and Weinberger, Christian and Halme, Janne and Kemell, Marianna and Smått, Jan-Henrik}, year={2026}, pages={166755} }","short":"S. Qudsia, A. Weiss, S. Sirkiä, F. Wang, E. Rosqvist, T.D. Los Arcos, C. Weinberger, J. Halme, M. Kemell, J.-H. Smått, Applied Surface Science (2026) 166755.","mla":"Qudsia, Syeda, et al. “Influence of Deposition Temperature and Thickness of ALD-TiO2 on Planar Perovskite Solar Cell Performance.” Applied Surface Science, 2026, p. 166755, doi:https://doi.org/10.1016/j.apsusc.2026.166755."},"_id":"65270","user_id":"11848","keyword":["Titanium dioxide","Atomic layer deposition","Electron transport layer","Perovskite solar cells"],"article_type":"original","language":[{"iso":"eng"}],"publication":"Applied Surface Science","type":"journal_article","abstract":[{"text":"In perovskite solar cells (PSCs), electron transport layers (ETLs) play an important role in the selection and transport of electrons. Understanding the properties of these layers in relation to device performance is essential for optimizing solar cell efficiency and enabling their integration into emerging architectures, such as flexible solar cells. Here, we deposited TiO2 at different thicknesses using atomic layer deposition (ALD), a technique well-suited for producing uniform and pinhole-free films. The crystal structure of the layers was controlled by depositing the films at three different temperatures: 150 °C, 250 °C, and 350 °C. The layers were characterized in detail to determine the morphology (by atomic force microscopy), surface composition (by X-ray photoelectron spectroscopy) and the crystal structure (by X-ray diffraction). The TiO2 layers were then incorporated as ETLs in planar perovskite solar cells to evaluate their influence on device performance. Higher deposition temperatures led to improvements in device fill factor and open-circuit voltage, leading to more efficient solar cells. Notably, the best device performance for the ALD-TiO2 layers was achieved with films deposited at 250 °C.","lang":"eng"}],"status":"public"}