---
_id: '65669'
abstract:
- lang: eng
  text: <jats:p>Local droplet etching and subsequent refilling enables the fabrication
    of highly symmetric quantum dots with low fine structure splitting, suitable for
    generating polarization entangled photons. While well established in GaAs/AlxGa1−xAs,
    this approach does not yield emission in the telecom bands required for low loss
    fiber-based quantum communication. To achieve emission at 1.55 μm, local droplet
    etching must be adapted to alternative material platforms such as InP. Here, we
    systematically investigate how the etching material deposition rate and etching
    time influence nanohole morphology in In0.52Al0.48As layers lattice-matched to
    InP. In the first experiment, InAl was deposited at fluxes of 0.2–4.0 Å s−1 at
    Tetch = 350 °C and 460 °C. Lower fluxes produced nanoholes with lower density
    and larger ring diameters, indicating fewer and larger initial droplets, consistent
    with scaling theory. The average nanohole diameter decreased monotonically with
    increasing flux, whereas the average depth showed no clear dependence on flux.
    In the second experiment, etching times of 30–600 s were tested for InAl, In,
    and Al droplets. Average nanohole diameters remained constant for Al across all
    etching times, but decreased for In and InAl with increasing etching time, suggesting
    sidewall redeposition during etching. For all droplet types, depths peaked at
    intermediate times and decreased for prolonged etching, consistent with material
    diffusion into the nanohole after droplet consumption.</jats:p>
article_number: '913'
author:
- first_name: Dennis
  full_name: Deutsch, Dennis
  id: '23489'
  last_name: Deutsch
- first_name: Dirk
  full_name: Reuter, Dirk
  id: '37763'
  last_name: Reuter
citation:
  ama: Deutsch D, Reuter D. Influence of the Etching Material Deposition Rate and
    Annealing Time on Nanohole Morphology Etched into InP/In0.52Al0.48As Layers via
    Local Droplet Epitaxy. <i>Crystals</i>. 2025;15(11). doi:<a href="https://doi.org/10.3390/cryst15110913">10.3390/cryst15110913</a>
  apa: Deutsch, D., &#38; Reuter, D. (2025). Influence of the Etching Material Deposition
    Rate and Annealing Time on Nanohole Morphology Etched into InP/In0.52Al0.48As
    Layers via Local Droplet Epitaxy. <i>Crystals</i>, <i>15</i>(11), Article 913.
    <a href="https://doi.org/10.3390/cryst15110913">https://doi.org/10.3390/cryst15110913</a>
  bibtex: '@article{Deutsch_Reuter_2025, title={Influence of the Etching Material
    Deposition Rate and Annealing Time on Nanohole Morphology Etched into InP/In0.52Al0.48As
    Layers via Local Droplet Epitaxy}, volume={15}, DOI={<a href="https://doi.org/10.3390/cryst15110913">10.3390/cryst15110913</a>},
    number={11913}, journal={Crystals}, publisher={MDPI AG}, author={Deutsch, Dennis
    and Reuter, Dirk}, year={2025} }'
  chicago: Deutsch, Dennis, and Dirk Reuter. “Influence of the Etching Material Deposition
    Rate and Annealing Time on Nanohole Morphology Etched into InP/In0.52Al0.48As
    Layers via Local Droplet Epitaxy.” <i>Crystals</i> 15, no. 11 (2025). <a href="https://doi.org/10.3390/cryst15110913">https://doi.org/10.3390/cryst15110913</a>.
  ieee: 'D. Deutsch and D. Reuter, “Influence of the Etching Material Deposition Rate
    and Annealing Time on Nanohole Morphology Etched into InP/In0.52Al0.48As Layers
    via Local Droplet Epitaxy,” <i>Crystals</i>, vol. 15, no. 11, Art. no. 913, 2025,
    doi: <a href="https://doi.org/10.3390/cryst15110913">10.3390/cryst15110913</a>.'
  mla: Deutsch, Dennis, and Dirk Reuter. “Influence of the Etching Material Deposition
    Rate and Annealing Time on Nanohole Morphology Etched into InP/In0.52Al0.48As
    Layers via Local Droplet Epitaxy.” <i>Crystals</i>, vol. 15, no. 11, 913, MDPI
    AG, 2025, doi:<a href="https://doi.org/10.3390/cryst15110913">10.3390/cryst15110913</a>.
  short: D. Deutsch, D. Reuter, Crystals 15 (2025).
date_created: 2026-05-21T06:35:35Z
date_updated: 2026-05-21T06:36:29Z
department:
- _id: '15'
- _id: '230'
doi: 10.3390/cryst15110913
intvolume: '        15'
issue: '11'
language:
- iso: eng
publication: Crystals
publication_identifier:
  issn:
  - 2073-4352
publication_status: published
publisher: MDPI AG
status: public
title: Influence of the Etching Material Deposition Rate and Annealing Time on Nanohole
  Morphology Etched into InP/In0.52Al0.48As Layers via Local Droplet Epitaxy
type: journal_article
user_id: '42514'
volume: 15
year: '2025'
...