---
res:
  bibo_abstract:
  - '<jats:p>Magnetron-sputtered CNx thin films are primarily employed as hard, low-friction
    protective and tribological coatings, as solar cells, and for catalytic applications.
    Lower growth rates and a reduced N content, favoring graphitic sp2 structures,
    hinder industrial scalability due to prolonged deposition times and produce softer,
    less dense films with inferior hardness, elasticity, and wear resistance. Carbon
    nitride films deposited by magnetron sputtering exhibit growth behavior strongly
    influenced by plasma–surface interactions. However, nitrogen resputtering and
    reduced film growth rates are commonly attributed to chemical etching by positive
    ions. We propose an additional, unreported power-dependent mechanism involving
    negative ions formed at the carbon target. These ions are accelerated through
    the plasma sheath, reaching the substrate with high kinetic energy and inducing
    both chemical and physical resputtering. This effect is localized to the geometrical
    projection of the target, as shown by spatially resolved analysis: ellipsometry
    reveals thickness reduction, and x-ray photoelectron spectroscopy and Raman spectroscopy
    indicate nitrogen depletion within this region. Correlation between stoichiometry
    and structural signatures confirms the decisive role of negative ions in modifying
    the film composition and microstructure. At the same time, the composition of
    the gas mixture exerts only a minor effect.</jats:p>@eng'
  bibo_authorlist:
  - foaf_Person:
      foaf_givenName: Christian
      foaf_name: Wieschhoff, Christian
      foaf_surname: Wieschhoff
  - foaf_Person:
      foaf_givenName: Chantal
      foaf_name: Theile-Rasche, Chantal
      foaf_surname: Theile-Rasche
  - foaf_Person:
      foaf_givenName: Fuzeng
      foaf_name: Wang, Fuzeng
      foaf_surname: Wang
  - foaf_Person:
      foaf_givenName: Michael
      foaf_name: Prib, Michael
      foaf_surname: Prib
  - foaf_Person:
      foaf_givenName: Viktoria Daniela Dorothea
      foaf_name: Moldt, Viktoria Daniela Dorothea
      foaf_surname: Moldt
  - foaf_Person:
      foaf_givenName: Guido
      foaf_name: Grundmeier, Guido
      foaf_surname: Grundmeier
      foaf_workInfoHomepage: http://www.librecat.org/personId=194
  - foaf_Person:
      foaf_givenName: Nieves López
      foaf_name: Salas, Nieves López
      foaf_surname: Salas
  - foaf_Person:
      foaf_givenName: Maria Teresa
      foaf_name: de los Arcos de Pedro, Maria Teresa
      foaf_surname: de los Arcos de Pedro
      foaf_workInfoHomepage: http://www.librecat.org/personId=54556
    orcid: '0000-0002-8684-273X '
  bibo_doi: 10.1063/5.0335780
  bibo_issue: '24'
  bibo_volume: 139
  dct_date: 2026^xs_gYear
  dct_isPartOf:
  - http://id.crossref.org/issn/0021-8979
  - http://id.crossref.org/issn/1089-7550
  dct_language: eng
  dct_publisher: AIP Publishing@
  dct_title: Influence of negative ions on the stoichiometry and structure of carbon
    nitride films deposited by reactive magnetron sputtering@
...