Influence of negative ions on the stoichiometry and structure of carbon nitride films deposited by reactive magnetron sputtering
C. Wieschhoff, C. Theile-Rasche, F. Wang, M. Prib, V.D.D. Moldt, G. Grundmeier, N.L. Salas, M.T. de los Arcos de Pedro, Journal of Applied Physics 139 (2026).