---
_id: '66040'
abstract:
- lang: eng
  text: '<jats:p>Magnetron-sputtered CNx thin films are primarily employed as hard,
    low-friction protective and tribological coatings, as solar cells, and for catalytic
    applications. Lower growth rates and a reduced N content, favoring graphitic sp2
    structures, hinder industrial scalability due to prolonged deposition times and
    produce softer, less dense films with inferior hardness, elasticity, and wear
    resistance. Carbon nitride films deposited by magnetron sputtering exhibit growth
    behavior strongly influenced by plasma–surface interactions. However, nitrogen
    resputtering and reduced film growth rates are commonly attributed to chemical
    etching by positive ions. We propose an additional, unreported power-dependent
    mechanism involving negative ions formed at the carbon target. These ions are
    accelerated through the plasma sheath, reaching the substrate with high kinetic
    energy and inducing both chemical and physical resputtering. This effect is localized
    to the geometrical projection of the target, as shown by spatially resolved analysis:
    ellipsometry reveals thickness reduction, and x-ray photoelectron spectroscopy
    and Raman spectroscopy indicate nitrogen depletion within this region. Correlation
    between stoichiometry and structural signatures confirms the decisive role of
    negative ions in modifying the film composition and microstructure. At the same
    time, the composition of the gas mixture exerts only a minor effect.</jats:p>'
article_number: '243301'
author:
- first_name: Christian
  full_name: Wieschhoff, Christian
  last_name: Wieschhoff
- first_name: Chantal
  full_name: Theile-Rasche, Chantal
  last_name: Theile-Rasche
- first_name: Fuzeng
  full_name: Wang, Fuzeng
  last_name: Wang
- first_name: Michael
  full_name: Prib, Michael
  last_name: Prib
- first_name: Viktoria Daniela Dorothea
  full_name: Moldt, Viktoria Daniela Dorothea
  last_name: Moldt
- first_name: Guido
  full_name: Grundmeier, Guido
  id: '194'
  last_name: Grundmeier
- first_name: Nieves López
  full_name: Salas, Nieves López
  last_name: Salas
- first_name: Maria Teresa
  full_name: de los Arcos de Pedro, Maria Teresa
  id: '54556'
  last_name: de los Arcos de Pedro
  orcid: '0000-0002-8684-273X '
citation:
  ama: Wieschhoff C, Theile-Rasche C, Wang F, et al. Influence of negative ions on
    the stoichiometry and structure of carbon nitride films deposited by reactive
    magnetron sputtering. <i>Journal of Applied Physics</i>. 2026;139(24). doi:<a
    href="https://doi.org/10.1063/5.0335780">10.1063/5.0335780</a>
  apa: Wieschhoff, C., Theile-Rasche, C., Wang, F., Prib, M., Moldt, V. D. D., Grundmeier,
    G., Salas, N. L., &#38; de los Arcos de Pedro, M. T. (2026). Influence of negative
    ions on the stoichiometry and structure of carbon nitride films deposited by reactive
    magnetron sputtering. <i>Journal of Applied Physics</i>, <i>139</i>(24), Article
    243301. <a href="https://doi.org/10.1063/5.0335780">https://doi.org/10.1063/5.0335780</a>
  bibtex: '@article{Wieschhoff_Theile-Rasche_Wang_Prib_Moldt_Grundmeier_Salas_de los
    Arcos de Pedro_2026, title={Influence of negative ions on the stoichiometry and
    structure of carbon nitride films deposited by reactive magnetron sputtering},
    volume={139}, DOI={<a href="https://doi.org/10.1063/5.0335780">10.1063/5.0335780</a>},
    number={24243301}, journal={Journal of Applied Physics}, publisher={AIP Publishing},
    author={Wieschhoff, Christian and Theile-Rasche, Chantal and Wang, Fuzeng and
    Prib, Michael and Moldt, Viktoria Daniela Dorothea and Grundmeier, Guido and Salas,
    Nieves López and de los Arcos de Pedro, Maria Teresa}, year={2026} }'
  chicago: Wieschhoff, Christian, Chantal Theile-Rasche, Fuzeng Wang, Michael Prib,
    Viktoria Daniela Dorothea Moldt, Guido Grundmeier, Nieves López Salas, and Maria
    Teresa de los Arcos de Pedro. “Influence of Negative Ions on the Stoichiometry
    and Structure of Carbon Nitride Films Deposited by Reactive Magnetron Sputtering.”
    <i>Journal of Applied Physics</i> 139, no. 24 (2026). <a href="https://doi.org/10.1063/5.0335780">https://doi.org/10.1063/5.0335780</a>.
  ieee: 'C. Wieschhoff <i>et al.</i>, “Influence of negative ions on the stoichiometry
    and structure of carbon nitride films deposited by reactive magnetron sputtering,”
    <i>Journal of Applied Physics</i>, vol. 139, no. 24, Art. no. 243301, 2026, doi:
    <a href="https://doi.org/10.1063/5.0335780">10.1063/5.0335780</a>.'
  mla: Wieschhoff, Christian, et al. “Influence of Negative Ions on the Stoichiometry
    and Structure of Carbon Nitride Films Deposited by Reactive Magnetron Sputtering.”
    <i>Journal of Applied Physics</i>, vol. 139, no. 24, 243301, AIP Publishing, 2026,
    doi:<a href="https://doi.org/10.1063/5.0335780">10.1063/5.0335780</a>.
  short: C. Wieschhoff, C. Theile-Rasche, F. Wang, M. Prib, V.D.D. Moldt, G. Grundmeier,
    N.L. Salas, M.T. de los Arcos de Pedro, Journal of Applied Physics 139 (2026).
date_created: 2026-06-25T12:15:04Z
date_updated: 2026-06-25T12:18:17Z
department:
- _id: '302'
doi: 10.1063/5.0335780
intvolume: '       139'
issue: '24'
language:
- iso: eng
publication: Journal of Applied Physics
publication_identifier:
  issn:
  - 0021-8979
  - 1089-7550
publication_status: published
publisher: AIP Publishing
status: public
title: Influence of negative ions on the stoichiometry and structure of carbon nitride
  films deposited by reactive magnetron sputtering
type: journal_article
user_id: '54556'
volume: 139
year: '2026'
...