[{"article_type":"original","publication_status":"published","date_updated":"2026-07-22T05:52:38Z","publication_identifier":{"issn":["1863-8880","1863-8899"]},"author":[{"last_name":"Kim","first_name":"Minjun","full_name":"Kim, Minjun"},{"id":"103814","last_name":"Devaraj","first_name":"Vasanthan","full_name":"Devaraj, Vasanthan"},{"first_name":"Hyeon‐Seok","last_name":"Seo","full_name":"Seo, Hyeon‐Seok"},{"full_name":"Eom, Seong‐Jae","last_name":"Eom","first_name":"Seong‐Jae"},{"full_name":"Lee, Jeong‐Su","last_name":"Lee","first_name":"Jeong‐Su"},{"full_name":"Lee, Donghan","first_name":"Donghan","last_name":"Lee"},{"first_name":"Min Yong","last_name":"Jeon","full_name":"Jeon, Min Yong"},{"full_name":"Zentgraf, Thomas","orcid":"0000-0002-8662-1101","last_name":"Zentgraf","first_name":"Thomas","id":"30525"},{"full_name":"Lee, Jong‐Min","first_name":"Jong‐Min","last_name":"Lee"}],"title":"Engineering Disordered Many‐Particle Plasmonic Nanoclusters for Wafer‐Scale Uniform and Giant Electromagnetic Field Enhancement","year":"2026","doi":"10.1002/lpor.71610","language":[{"iso":"eng"}],"article_number":"e71610","main_file_link":[{"open_access":"1","url":"https://onlinelibrary.wiley.com/doi/10.1002/lpor.71610"}],"abstract":[{"lang":"eng","text":"Scalable plasmonic technologies face a critical trade‐off: few‐body architectures offer high enhancement but are sensitive to fabrication flaws, while scalable methods like solid‐state dewetting yield large, low‐enhancement gaps. We introduce a paradigm shift using a many‐body plasmonic architecture inspired by statistical mechanics. By moving toward the continuum limit, local geometric variations are statistically averaged out, effectively decoupling optical performance from microscopic disorder. We implement this concept via a lithography‐ and etching‐free, multi‐step dewetting strategy, creating wafer‐scale nanoclusters. This process strategically forms a robust many‐body system by introducing numerous small satellite nanoparticles between larger particles. Crucially, this design achieves a high collective enhancement that surpasses even optimized few‐body systems, despite having larger individual gaps. Under optimized conditions, these substrates exhibit a surface‐enhanced Raman scattering enhancement factor approaching 4 × 10^8 with unprecedented reproducibility (RSD of ∼10%). This scalable, low‐cost concept establishes a practical route toward reproducible wafer‐scale nanophotonic platforms for sensing, spectroscopy, and quantum technologies."}],"publication":"Laser &amp; Photonics Reviews","department":[{"_id":"15"},{"_id":"230"},{"_id":"289"},{"_id":"623"}],"type":"journal_article","date_created":"2026-07-22T05:49:50Z","status":"public","user_id":"30525","_id":"66555","publisher":"Wiley","quality_controlled":"1","citation":{"chicago":"Kim, Minjun, Vasanthan Devaraj, Hyeon‐Seok Seo, Seong‐Jae Eom, Jeong‐Su Lee, Donghan Lee, Min Yong Jeon, Thomas Zentgraf, and Jong‐Min Lee. “Engineering Disordered Many‐Particle Plasmonic Nanoclusters for Wafer‐Scale Uniform and Giant Electromagnetic Field Enhancement.” <i>Laser &#38;amp; Photonics Reviews</i>, 2026. <a href=\"https://doi.org/10.1002/lpor.71610\">https://doi.org/10.1002/lpor.71610</a>.","short":"M. Kim, V. Devaraj, H. Seo, S. Eom, J. Lee, D. Lee, M.Y. Jeon, T. Zentgraf, J. Lee, Laser &#38;amp; Photonics Reviews (2026).","apa":"Kim, M., Devaraj, V., Seo, H., Eom, S., Lee, J., Lee, D., Jeon, M. Y., Zentgraf, T., &#38; Lee, J. (2026). Engineering Disordered Many‐Particle Plasmonic Nanoclusters for Wafer‐Scale Uniform and Giant Electromagnetic Field Enhancement. <i>Laser &#38;amp; Photonics Reviews</i>, Article e71610. <a href=\"https://doi.org/10.1002/lpor.71610\">https://doi.org/10.1002/lpor.71610</a>","ieee":"M. Kim <i>et al.</i>, “Engineering Disordered Many‐Particle Plasmonic Nanoclusters for Wafer‐Scale Uniform and Giant Electromagnetic Field Enhancement,” <i>Laser &#38;amp; Photonics Reviews</i>, Art. no. e71610, 2026, doi: <a href=\"https://doi.org/10.1002/lpor.71610\">10.1002/lpor.71610</a>.","ama":"Kim M, Devaraj V, Seo H, et al. Engineering Disordered Many‐Particle Plasmonic Nanoclusters for Wafer‐Scale Uniform and Giant Electromagnetic Field Enhancement. <i>Laser &#38;amp; Photonics Reviews</i>. Published online 2026. doi:<a href=\"https://doi.org/10.1002/lpor.71610\">10.1002/lpor.71610</a>","bibtex":"@article{Kim_Devaraj_Seo_Eom_Lee_Lee_Jeon_Zentgraf_Lee_2026, title={Engineering Disordered Many‐Particle Plasmonic Nanoclusters for Wafer‐Scale Uniform and Giant Electromagnetic Field Enhancement}, DOI={<a href=\"https://doi.org/10.1002/lpor.71610\">10.1002/lpor.71610</a>}, number={e71610}, journal={Laser &#38;amp; Photonics Reviews}, publisher={Wiley}, author={Kim, Minjun and Devaraj, Vasanthan and Seo, Hyeon‐Seok and Eom, Seong‐Jae and Lee, Jeong‐Su and Lee, Donghan and Jeon, Min Yong and Zentgraf, Thomas and Lee, Jong‐Min}, year={2026} }","mla":"Kim, Minjun, et al. “Engineering Disordered Many‐Particle Plasmonic Nanoclusters for Wafer‐Scale Uniform and Giant Electromagnetic Field Enhancement.” <i>Laser &#38;amp; Photonics Reviews</i>, e71610, Wiley, 2026, doi:<a href=\"https://doi.org/10.1002/lpor.71610\">10.1002/lpor.71610</a>."},"oa":"1"}]