---
_id: '66555'
abstract:
- lang: eng
  text: 'Scalable plasmonic technologies face a critical trade‐off: few‐body architectures
    offer high enhancement but are sensitive to fabrication flaws, while scalable
    methods like solid‐state dewetting yield large, low‐enhancement gaps. We introduce
    a paradigm shift using a many‐body plasmonic architecture inspired by statistical
    mechanics. By moving toward the continuum limit, local geometric variations are
    statistically averaged out, effectively decoupling optical performance from microscopic
    disorder. We implement this concept via a lithography‐ and etching‐free, multi‐step
    dewetting strategy, creating wafer‐scale nanoclusters. This process strategically
    forms a robust many‐body system by introducing numerous small satellite nanoparticles
    between larger particles. Crucially, this design achieves a high collective enhancement
    that surpasses even optimized few‐body systems, despite having larger individual
    gaps. Under optimized conditions, these substrates exhibit a surface‐enhanced
    Raman scattering enhancement factor approaching 4 × 10^8 with unprecedented reproducibility
    (RSD of ∼10%). This scalable, low‐cost concept establishes a practical route toward
    reproducible wafer‐scale nanophotonic platforms for sensing, spectroscopy, and
    quantum technologies.'
article_number: e71610
article_type: original
author:
- first_name: Minjun
  full_name: Kim, Minjun
  last_name: Kim
- first_name: Vasanthan
  full_name: Devaraj, Vasanthan
  id: '103814'
  last_name: Devaraj
- first_name: Hyeon‐Seok
  full_name: Seo, Hyeon‐Seok
  last_name: Seo
- first_name: Seong‐Jae
  full_name: Eom, Seong‐Jae
  last_name: Eom
- first_name: Jeong‐Su
  full_name: Lee, Jeong‐Su
  last_name: Lee
- first_name: Donghan
  full_name: Lee, Donghan
  last_name: Lee
- first_name: Min Yong
  full_name: Jeon, Min Yong
  last_name: Jeon
- first_name: Thomas
  full_name: Zentgraf, Thomas
  id: '30525'
  last_name: Zentgraf
  orcid: 0000-0002-8662-1101
- first_name: Jong‐Min
  full_name: Lee, Jong‐Min
  last_name: Lee
citation:
  ama: Kim M, Devaraj V, Seo H, et al. Engineering Disordered Many‐Particle Plasmonic
    Nanoclusters for Wafer‐Scale Uniform and Giant Electromagnetic Field Enhancement.
    <i>Laser &#38;amp; Photonics Reviews</i>. Published online 2026. doi:<a href="https://doi.org/10.1002/lpor.71610">10.1002/lpor.71610</a>
  apa: Kim, M., Devaraj, V., Seo, H., Eom, S., Lee, J., Lee, D., Jeon, M. Y., Zentgraf,
    T., &#38; Lee, J. (2026). Engineering Disordered Many‐Particle Plasmonic Nanoclusters
    for Wafer‐Scale Uniform and Giant Electromagnetic Field Enhancement. <i>Laser
    &#38;amp; Photonics Reviews</i>, Article e71610. <a href="https://doi.org/10.1002/lpor.71610">https://doi.org/10.1002/lpor.71610</a>
  bibtex: '@article{Kim_Devaraj_Seo_Eom_Lee_Lee_Jeon_Zentgraf_Lee_2026, title={Engineering
    Disordered Many‐Particle Plasmonic Nanoclusters for Wafer‐Scale Uniform and Giant
    Electromagnetic Field Enhancement}, DOI={<a href="https://doi.org/10.1002/lpor.71610">10.1002/lpor.71610</a>},
    number={e71610}, journal={Laser &#38;amp; Photonics Reviews}, publisher={Wiley},
    author={Kim, Minjun and Devaraj, Vasanthan and Seo, Hyeon‐Seok and Eom, Seong‐Jae
    and Lee, Jeong‐Su and Lee, Donghan and Jeon, Min Yong and Zentgraf, Thomas and
    Lee, Jong‐Min}, year={2026} }'
  chicago: Kim, Minjun, Vasanthan Devaraj, Hyeon‐Seok Seo, Seong‐Jae Eom, Jeong‐Su
    Lee, Donghan Lee, Min Yong Jeon, Thomas Zentgraf, and Jong‐Min Lee. “Engineering
    Disordered Many‐Particle Plasmonic Nanoclusters for Wafer‐Scale Uniform and Giant
    Electromagnetic Field Enhancement.” <i>Laser &#38;amp; Photonics Reviews</i>,
    2026. <a href="https://doi.org/10.1002/lpor.71610">https://doi.org/10.1002/lpor.71610</a>.
  ieee: 'M. Kim <i>et al.</i>, “Engineering Disordered Many‐Particle Plasmonic Nanoclusters
    for Wafer‐Scale Uniform and Giant Electromagnetic Field Enhancement,” <i>Laser
    &#38;amp; Photonics Reviews</i>, Art. no. e71610, 2026, doi: <a href="https://doi.org/10.1002/lpor.71610">10.1002/lpor.71610</a>.'
  mla: Kim, Minjun, et al. “Engineering Disordered Many‐Particle Plasmonic Nanoclusters
    for Wafer‐Scale Uniform and Giant Electromagnetic Field Enhancement.” <i>Laser
    &#38;amp; Photonics Reviews</i>, e71610, Wiley, 2026, doi:<a href="https://doi.org/10.1002/lpor.71610">10.1002/lpor.71610</a>.
  short: M. Kim, V. Devaraj, H. Seo, S. Eom, J. Lee, D. Lee, M.Y. Jeon, T. Zentgraf,
    J. Lee, Laser &#38;amp; Photonics Reviews (2026).
date_created: 2026-07-22T05:49:50Z
date_updated: 2026-07-22T05:52:38Z
department:
- _id: '15'
- _id: '230'
- _id: '289'
- _id: '623'
doi: 10.1002/lpor.71610
language:
- iso: eng
main_file_link:
- open_access: '1'
  url: https://onlinelibrary.wiley.com/doi/10.1002/lpor.71610
oa: '1'
publication: Laser &amp; Photonics Reviews
publication_identifier:
  issn:
  - 1863-8880
  - 1863-8899
publication_status: published
publisher: Wiley
quality_controlled: '1'
status: public
title: Engineering Disordered Many‐Particle Plasmonic Nanoclusters for Wafer‐Scale
  Uniform and Giant Electromagnetic Field Enhancement
type: journal_article
user_id: '30525'
year: '2026'
...
