[{"_id":"7497","user_id":"20798","department":[{"_id":"15"},{"_id":"230"},{"_id":"287"},{"_id":"35"}],"article_number":"2097","language":[{"iso":"eng"}],"type":"journal_article","publication":"Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures","status":"public","date_updated":"2022-01-06T07:03:39Z","publisher":"American Vacuum Society","date_created":"2019-02-04T14:44:44Z","author":[{"last_name":"Mehta","full_name":"Mehta, M.","first_name":"M."},{"full_name":"Ruth, M.","last_name":"Ruth","first_name":"M."},{"full_name":"Piegdon, K. A.","last_name":"Piegdon","first_name":"K. A."},{"last_name":"Krix","full_name":"Krix, D.","first_name":"D."},{"first_name":"H.","last_name":"Nienhaus","full_name":"Nienhaus, H."},{"orcid":"https://orcid.org/0000-0002-3787-3572","last_name":"Meier","id":"20798","full_name":"Meier, Cedrik","first_name":"Cedrik"}],"volume":27,"title":"Inductively coupled plasma reactive ion etching of bulk ZnO single crystal and molecular beam epitaxy grown ZnO films","doi":"10.1116/1.3186528","publication_status":"published","publication_identifier":{"issn":["1071-1023"]},"issue":"5","year":"2009","citation":{"mla":"Mehta, M., et al. “Inductively Coupled Plasma Reactive Ion Etching of Bulk ZnO Single Crystal and Molecular Beam Epitaxy Grown ZnO Films.” <i>Journal of Vacuum Science &#38; Technology B: Microelectronics and Nanometer Structures</i>, vol. 27, no. 5, 2097, American Vacuum Society, 2009, doi:<a href=\"https://doi.org/10.1116/1.3186528\">10.1116/1.3186528</a>.","short":"M. Mehta, M. Ruth, K.A. Piegdon, D. Krix, H. Nienhaus, C. Meier, Journal of Vacuum Science &#38; Technology B: Microelectronics and Nanometer Structures 27 (2009).","bibtex":"@article{Mehta_Ruth_Piegdon_Krix_Nienhaus_Meier_2009, title={Inductively coupled plasma reactive ion etching of bulk ZnO single crystal and molecular beam epitaxy grown ZnO films}, volume={27}, DOI={<a href=\"https://doi.org/10.1116/1.3186528\">10.1116/1.3186528</a>}, number={52097}, journal={Journal of Vacuum Science &#38; Technology B: Microelectronics and Nanometer Structures}, publisher={American Vacuum Society}, author={Mehta, M. and Ruth, M. and Piegdon, K. A. and Krix, D. and Nienhaus, H. and Meier, Cedrik}, year={2009} }","apa":"Mehta, M., Ruth, M., Piegdon, K. A., Krix, D., Nienhaus, H., &#38; Meier, C. (2009). Inductively coupled plasma reactive ion etching of bulk ZnO single crystal and molecular beam epitaxy grown ZnO films. <i>Journal of Vacuum Science &#38; Technology B: Microelectronics and Nanometer Structures</i>, <i>27</i>(5). <a href=\"https://doi.org/10.1116/1.3186528\">https://doi.org/10.1116/1.3186528</a>","ama":"Mehta M, Ruth M, Piegdon KA, Krix D, Nienhaus H, Meier C. Inductively coupled plasma reactive ion etching of bulk ZnO single crystal and molecular beam epitaxy grown ZnO films. <i>Journal of Vacuum Science &#38; Technology B: Microelectronics and Nanometer Structures</i>. 2009;27(5). doi:<a href=\"https://doi.org/10.1116/1.3186528\">10.1116/1.3186528</a>","ieee":"M. Mehta, M. Ruth, K. A. Piegdon, D. Krix, H. Nienhaus, and C. Meier, “Inductively coupled plasma reactive ion etching of bulk ZnO single crystal and molecular beam epitaxy grown ZnO films,” <i>Journal of Vacuum Science &#38; Technology B: Microelectronics and Nanometer Structures</i>, vol. 27, no. 5, 2009.","chicago":"Mehta, M., M. Ruth, K. A. Piegdon, D. Krix, H. Nienhaus, and Cedrik Meier. “Inductively Coupled Plasma Reactive Ion Etching of Bulk ZnO Single Crystal and Molecular Beam Epitaxy Grown ZnO Films.” <i>Journal of Vacuum Science &#38; Technology B: Microelectronics and Nanometer Structures</i> 27, no. 5 (2009). <a href=\"https://doi.org/10.1116/1.3186528\">https://doi.org/10.1116/1.3186528</a>."},"intvolume":"        27"}]