{"publication_status":"published","doi":"10.1116/1.3186528","language":[{"iso":"eng"}],"status":"public","author":[{"last_name":"Mehta","full_name":"Mehta, M.","first_name":"M."},{"first_name":"M.","full_name":"Ruth, M.","last_name":"Ruth"},{"first_name":"K. A.","full_name":"Piegdon, K. A.","last_name":"Piegdon"},{"last_name":"Krix","full_name":"Krix, D.","first_name":"D."},{"last_name":"Nienhaus","full_name":"Nienhaus, H.","first_name":"H."},{"id":"20798","first_name":"Cedrik","last_name":"Meier","full_name":"Meier, Cedrik","orcid":"https://orcid.org/0000-0002-3787-3572"}],"department":[{"_id":"15"},{"_id":"230"},{"_id":"287"},{"_id":"35"}],"publication_identifier":{"issn":["1071-1023"]},"type":"journal_article","volume":27,"date_updated":"2022-01-06T07:03:39Z","date_created":"2019-02-04T14:44:44Z","intvolume":"        27","year":"2009","title":"Inductively coupled plasma reactive ion etching of bulk ZnO single crystal and molecular beam epitaxy grown ZnO films","citation":{"mla":"Mehta, M., et al. “Inductively Coupled Plasma Reactive Ion Etching of Bulk ZnO Single Crystal and Molecular Beam Epitaxy Grown ZnO Films.” <i>Journal of Vacuum Science &#38; Technology B: Microelectronics and Nanometer Structures</i>, vol. 27, no. 5, 2097, American Vacuum Society, 2009, doi:<a href=\"https://doi.org/10.1116/1.3186528\">10.1116/1.3186528</a>.","ieee":"M. Mehta, M. Ruth, K. A. Piegdon, D. Krix, H. Nienhaus, and C. Meier, “Inductively coupled plasma reactive ion etching of bulk ZnO single crystal and molecular beam epitaxy grown ZnO films,” <i>Journal of Vacuum Science &#38; Technology B: Microelectronics and Nanometer Structures</i>, vol. 27, no. 5, 2009.","bibtex":"@article{Mehta_Ruth_Piegdon_Krix_Nienhaus_Meier_2009, title={Inductively coupled plasma reactive ion etching of bulk ZnO single crystal and molecular beam epitaxy grown ZnO films}, volume={27}, DOI={<a href=\"https://doi.org/10.1116/1.3186528\">10.1116/1.3186528</a>}, number={52097}, journal={Journal of Vacuum Science &#38; Technology B: Microelectronics and Nanometer Structures}, publisher={American Vacuum Society}, author={Mehta, M. and Ruth, M. and Piegdon, K. A. and Krix, D. and Nienhaus, H. and Meier, Cedrik}, year={2009} }","short":"M. Mehta, M. Ruth, K.A. Piegdon, D. Krix, H. Nienhaus, C. Meier, Journal of Vacuum Science &#38; Technology B: Microelectronics and Nanometer Structures 27 (2009).","chicago":"Mehta, M., M. Ruth, K. A. Piegdon, D. Krix, H. Nienhaus, and Cedrik Meier. “Inductively Coupled Plasma Reactive Ion Etching of Bulk ZnO Single Crystal and Molecular Beam Epitaxy Grown ZnO Films.” <i>Journal of Vacuum Science &#38; Technology B: Microelectronics and Nanometer Structures</i> 27, no. 5 (2009). <a href=\"https://doi.org/10.1116/1.3186528\">https://doi.org/10.1116/1.3186528</a>.","apa":"Mehta, M., Ruth, M., Piegdon, K. A., Krix, D., Nienhaus, H., &#38; Meier, C. (2009). Inductively coupled plasma reactive ion etching of bulk ZnO single crystal and molecular beam epitaxy grown ZnO films. <i>Journal of Vacuum Science &#38; Technology B: Microelectronics and Nanometer Structures</i>, <i>27</i>(5). <a href=\"https://doi.org/10.1116/1.3186528\">https://doi.org/10.1116/1.3186528</a>","ama":"Mehta M, Ruth M, Piegdon KA, Krix D, Nienhaus H, Meier C. Inductively coupled plasma reactive ion etching of bulk ZnO single crystal and molecular beam epitaxy grown ZnO films. <i>Journal of Vacuum Science &#38; Technology B: Microelectronics and Nanometer Structures</i>. 2009;27(5). doi:<a href=\"https://doi.org/10.1116/1.3186528\">10.1116/1.3186528</a>"},"_id":"7497","user_id":"20798","publisher":"American Vacuum Society","publication":"Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures","issue":"5","article_number":"2097"}