article published M. Mehta author M. Ruth author K. A. Piegdon author D. Krix author H. Nienhaus author Cedrik Meier author 20798https://orcid.org/0000-0002-3787-3572 15 department 230 department 287 department 35 department American Vacuum Society2009 eng 1071-102310.1116/1.3186528 275 Mehta, M., Ruth, M., Piegdon, K. A., Krix, D., Nienhaus, H., &#38; Meier, C. (2009). Inductively coupled plasma reactive ion etching of bulk ZnO single crystal and molecular beam epitaxy grown ZnO films. <i>Journal of Vacuum Science &#38; Technology B: Microelectronics and Nanometer Structures</i>, <i>27</i>(5). <a href="https://doi.org/10.1116/1.3186528">https://doi.org/10.1116/1.3186528</a> M. Mehta, M. Ruth, K.A. Piegdon, D. Krix, H. Nienhaus, C. Meier, Journal of Vacuum Science &#38; Technology B: Microelectronics and Nanometer Structures 27 (2009). @article{Mehta_Ruth_Piegdon_Krix_Nienhaus_Meier_2009, title={Inductively coupled plasma reactive ion etching of bulk ZnO single crystal and molecular beam epitaxy grown ZnO films}, volume={27}, DOI={<a href="https://doi.org/10.1116/1.3186528">10.1116/1.3186528</a>}, number={52097}, journal={Journal of Vacuum Science &#38; Technology B: Microelectronics and Nanometer Structures}, publisher={American Vacuum Society}, author={Mehta, M. and Ruth, M. and Piegdon, K. A. and Krix, D. and Nienhaus, H. and Meier, Cedrik}, year={2009} } Mehta, M., et al. “Inductively Coupled Plasma Reactive Ion Etching of Bulk ZnO Single Crystal and Molecular Beam Epitaxy Grown ZnO Films.” <i>Journal of Vacuum Science &#38; Technology B: Microelectronics and Nanometer Structures</i>, vol. 27, no. 5, 2097, American Vacuum Society, 2009, doi:<a href="https://doi.org/10.1116/1.3186528">10.1116/1.3186528</a>. Mehta, M., M. Ruth, K. A. Piegdon, D. Krix, H. Nienhaus, and Cedrik Meier. “Inductively Coupled Plasma Reactive Ion Etching of Bulk ZnO Single Crystal and Molecular Beam Epitaxy Grown ZnO Films.” <i>Journal of Vacuum Science &#38; Technology B: Microelectronics and Nanometer Structures</i> 27, no. 5 (2009). <a href="https://doi.org/10.1116/1.3186528">https://doi.org/10.1116/1.3186528</a>. M. Mehta, M. Ruth, K. A. Piegdon, D. Krix, H. Nienhaus, and C. Meier, “Inductively coupled plasma reactive ion etching of bulk ZnO single crystal and molecular beam epitaxy grown ZnO films,” <i>Journal of Vacuum Science &#38; Technology B: Microelectronics and Nanometer Structures</i>, vol. 27, no. 5, 2009. Mehta M, Ruth M, Piegdon KA, Krix D, Nienhaus H, Meier C. Inductively coupled plasma reactive ion etching of bulk ZnO single crystal and molecular beam epitaxy grown ZnO films. <i>Journal of Vacuum Science &#38; Technology B: Microelectronics and Nanometer Structures</i>. 2009;27(5). doi:<a href="https://doi.org/10.1116/1.3186528">10.1116/1.3186528</a> 74972019-02-04T14:44:44Z2022-01-06T07:03:39Z