[{"user_id":"20798","issue":"10","date_created":"2019-02-13T14:49:57Z","publication_status":"published","citation":{"apa":"Meier, C., Reuter, D., Riedesel, C., &#38; Wieck, A. D. (2003). Fabrication of two-dimensional electron systems by focused ion beam doping of III/V semiconductor heterostructures. <i>Journal of Applied Physics</i>, <i>93</i>(10), 6100–6106. <a href=\"https://doi.org/10.1063/1.1563032\">https://doi.org/10.1063/1.1563032</a>","ieee":"C. Meier, D. Reuter, C. Riedesel, and A. D. Wieck, “Fabrication of two-dimensional electron systems by focused ion beam doping of III/V semiconductor heterostructures,” <i>Journal of Applied Physics</i>, vol. 93, no. 10, pp. 6100–6106, 2003.","short":"C. Meier, D. Reuter, C. Riedesel, A.D. Wieck, Journal of Applied Physics 93 (2003) 6100–6106.","chicago":"Meier, Cedrik, Dirk Reuter, Christof Riedesel, and Andreas D. Wieck. “Fabrication of Two-Dimensional Electron Systems by Focused Ion Beam Doping of III/V Semiconductor Heterostructures.” <i>Journal of Applied Physics</i> 93, no. 10 (2003): 6100–6106. <a href=\"https://doi.org/10.1063/1.1563032\">https://doi.org/10.1063/1.1563032</a>.","ama":"Meier C, Reuter D, Riedesel C, Wieck AD. Fabrication of two-dimensional electron systems by focused ion beam doping of III/V semiconductor heterostructures. <i>Journal of Applied Physics</i>. 2003;93(10):6100-6106. doi:<a href=\"https://doi.org/10.1063/1.1563032\">10.1063/1.1563032</a>","bibtex":"@article{Meier_Reuter_Riedesel_Wieck_2003, title={Fabrication of two-dimensional electron systems by focused ion beam doping of III/V semiconductor heterostructures}, volume={93}, DOI={<a href=\"https://doi.org/10.1063/1.1563032\">10.1063/1.1563032</a>}, number={10}, journal={Journal of Applied Physics}, publisher={AIP Publishing}, author={Meier, Cedrik and Reuter, Dirk and Riedesel, Christof and Wieck, Andreas D.}, year={2003}, pages={6100–6106} }","mla":"Meier, Cedrik, et al. “Fabrication of Two-Dimensional Electron Systems by Focused Ion Beam Doping of III/V Semiconductor Heterostructures.” <i>Journal of Applied Physics</i>, vol. 93, no. 10, AIP Publishing, 2003, pp. 6100–06, doi:<a href=\"https://doi.org/10.1063/1.1563032\">10.1063/1.1563032</a>."},"department":[{"_id":"15"}],"author":[{"id":"20798","first_name":"Cedrik","full_name":"Meier, Cedrik","last_name":"Meier"},{"first_name":"Dirk","full_name":"Reuter, Dirk","last_name":"Reuter"},{"last_name":"Riedesel","full_name":"Riedesel, Christof","first_name":"Christof"},{"first_name":"Andreas D.","full_name":"Wieck, Andreas D.","last_name":"Wieck"}],"status":"public","year":"2003","title":"Fabrication of two-dimensional electron systems by focused ion beam doping of III/V semiconductor heterostructures","type":"journal_article","page":"6100-6106","extern":"1","date_updated":"2019-02-14T14:21:16Z","_id":"7681","publication_identifier":{"issn":["0021-8979","1089-7550"]},"volume":93,"publication":"Journal of Applied Physics","language":[{"iso":"eng"}],"intvolume":"        93","publisher":"AIP Publishing","doi":"10.1063/1.1563032"}]