{"conference":{"name":"26th Annual Conference of the IEEE-Industrial-Electronics-Society"},"publication":"IECON Proc. ","type":"conference","date_updated":"2022-01-06T07:03:44Z","page":"1878","language":[{"iso":"eng"}],"department":[{"_id":"15"}],"title":"Laterally resolved doping by focused ion beam implantation","_id":"7692","date_created":"2019-02-13T14:59:13Z","citation":{"ama":"Reuter D, Meier C, Alvarez MA, Koch J, Wieck AD. Laterally resolved doping by focused ion beam implantation. In: <i>IECON Proc. </i>. ; 2000:1878.","mla":"Reuter, D., et al. “Laterally Resolved Doping by Focused Ion Beam Implantation.” <i>IECON Proc. </i>, 2000, p. 1878.","ieee":"D. Reuter, C. Meier, M. A. Alvarez, J. Koch, and A. D. Wieck, “Laterally resolved doping by focused ion beam implantation,” in <i>IECON Proc. </i>, 2000, p. 1878.","apa":"Reuter, D., Meier, C., Alvarez, M. A., Koch, J., &#38; Wieck, A. D. (2000). Laterally resolved doping by focused ion beam implantation. In <i>IECON Proc. </i> (p. 1878).","bibtex":"@inproceedings{Reuter_Meier_Alvarez_Koch_Wieck_2000, title={Laterally resolved doping by focused ion beam implantation}, booktitle={IECON Proc. }, author={Reuter, D. and Meier, Cedrik and Alvarez, M. A. and Koch, J. and Wieck, A. D.}, year={2000}, pages={1878} }","chicago":"Reuter, D., Cedrik Meier, M. A. Alvarez, J. Koch, and A. D. Wieck. “Laterally Resolved Doping by Focused Ion Beam Implantation.” In <i>IECON Proc. </i>, 1878, 2000.","short":"D. Reuter, C. Meier, M.A. Alvarez, J. Koch, A.D. Wieck, in: IECON Proc. , 2000, p. 1878."},"user_id":"20798","year":"2000","status":"public","author":[{"first_name":"D.","last_name":"Reuter","full_name":"Reuter, D."},{"orcid":"https://orcid.org/0000-0002-3787-3572","first_name":"Cedrik","last_name":"Meier","id":"20798","full_name":"Meier, Cedrik"},{"full_name":"Alvarez, M. A.","last_name":"Alvarez","first_name":"M. A."},{"full_name":"Koch, J.","last_name":"Koch","first_name":"J."},{"full_name":"Wieck, A. D.","last_name":"Wieck","first_name":"A. D."}],"extern":"1"}