{"title":"Fabrication of two-dimensional electron systems by focused ion beam doping of III/V semiconductor heterostructures","_id":"8720","publication_identifier":{"issn":["0021-8979","1089-7550"]},"department":[{"_id":"15"},{"_id":"230"}],"user_id":"42514","citation":{"ieee":"C. Meier, D. Reuter, C. Riedesel, and A. D. Wieck, “Fabrication of two-dimensional electron systems by focused ion beam doping of III/V semiconductor heterostructures,” Journal of Applied Physics, pp. 6100–6106, 2003.","ama":"Meier C, Reuter D, Riedesel C, Wieck AD. Fabrication of two-dimensional electron systems by focused ion beam doping of III/V semiconductor heterostructures. Journal of Applied Physics. 2003:6100-6106. doi:10.1063/1.1563032","mla":"Meier, Cedrik, et al. “Fabrication of Two-Dimensional Electron Systems by Focused Ion Beam Doping of III/V Semiconductor Heterostructures.” Journal of Applied Physics, 2003, pp. 6100–06, doi:10.1063/1.1563032.","bibtex":"@article{Meier_Reuter_Riedesel_Wieck_2003, title={Fabrication of two-dimensional electron systems by focused ion beam doping of III/V semiconductor heterostructures}, DOI={10.1063/1.1563032}, journal={Journal of Applied Physics}, author={Meier, Cedrik and Reuter, Dirk and Riedesel, Christof and Wieck, Andreas D.}, year={2003}, pages={6100–6106} }","apa":"Meier, C., Reuter, D., Riedesel, C., & Wieck, A. D. (2003). Fabrication of two-dimensional electron systems by focused ion beam doping of III/V semiconductor heterostructures. Journal of Applied Physics, 6100–6106. https://doi.org/10.1063/1.1563032","short":"C. Meier, D. Reuter, C. Riedesel, A.D. Wieck, Journal of Applied Physics (2003) 6100–6106.","chicago":"Meier, Cedrik, Dirk Reuter, Christof Riedesel, and Andreas D. Wieck. “Fabrication of Two-Dimensional Electron Systems by Focused Ion Beam Doping of III/V Semiconductor Heterostructures.” Journal of Applied Physics, 2003, 6100–6106. https://doi.org/10.1063/1.1563032."},"date_created":"2019-03-28T14:54:53Z","status":"public","year":"2003","author":[{"first_name":"Cedrik","full_name":"Meier, Cedrik","last_name":"Meier"},{"first_name":"Dirk","full_name":"Reuter, Dirk","id":"37763","last_name":"Reuter"},{"first_name":"Christof","full_name":"Riedesel, Christof","last_name":"Riedesel"},{"last_name":"Wieck","full_name":"Wieck, Andreas D.","first_name":"Andreas D."}],"doi":"10.1063/1.1563032","page":"6100-6106","date_updated":"2022-01-06T07:03:59Z","type":"journal_article","publication":"Journal of Applied Physics","language":[{"iso":"eng"}],"publication_status":"published"}