---
_id: '8720'
author:
- first_name: Cedrik
  full_name: Meier, Cedrik
  last_name: Meier
- first_name: Dirk
  full_name: Reuter, Dirk
  id: '37763'
  last_name: Reuter
- first_name: Christof
  full_name: Riedesel, Christof
  last_name: Riedesel
- first_name: Andreas D.
  full_name: Wieck, Andreas D.
  last_name: Wieck
citation:
  ama: Meier C, Reuter D, Riedesel C, Wieck AD. Fabrication of two-dimensional electron
    systems by focused ion beam doping of III/V semiconductor heterostructures. <i>Journal
    of Applied Physics</i>. 2003:6100-6106. doi:<a href="https://doi.org/10.1063/1.1563032">10.1063/1.1563032</a>
  apa: Meier, C., Reuter, D., Riedesel, C., &#38; Wieck, A. D. (2003). Fabrication
    of two-dimensional electron systems by focused ion beam doping of III/V semiconductor
    heterostructures. <i>Journal of Applied Physics</i>, 6100–6106. <a href="https://doi.org/10.1063/1.1563032">https://doi.org/10.1063/1.1563032</a>
  bibtex: '@article{Meier_Reuter_Riedesel_Wieck_2003, title={Fabrication of two-dimensional
    electron systems by focused ion beam doping of III/V semiconductor heterostructures},
    DOI={<a href="https://doi.org/10.1063/1.1563032">10.1063/1.1563032</a>}, journal={Journal
    of Applied Physics}, author={Meier, Cedrik and Reuter, Dirk and Riedesel, Christof
    and Wieck, Andreas D.}, year={2003}, pages={6100–6106} }'
  chicago: Meier, Cedrik, Dirk Reuter, Christof Riedesel, and Andreas D. Wieck. “Fabrication
    of Two-Dimensional Electron Systems by Focused Ion Beam Doping of III/V Semiconductor
    Heterostructures.” <i>Journal of Applied Physics</i>, 2003, 6100–6106. <a href="https://doi.org/10.1063/1.1563032">https://doi.org/10.1063/1.1563032</a>.
  ieee: C. Meier, D. Reuter, C. Riedesel, and A. D. Wieck, “Fabrication of two-dimensional
    electron systems by focused ion beam doping of III/V semiconductor heterostructures,”
    <i>Journal of Applied Physics</i>, pp. 6100–6106, 2003.
  mla: Meier, Cedrik, et al. “Fabrication of Two-Dimensional Electron Systems by Focused
    Ion Beam Doping of III/V Semiconductor Heterostructures.” <i>Journal of Applied
    Physics</i>, 2003, pp. 6100–06, doi:<a href="https://doi.org/10.1063/1.1563032">10.1063/1.1563032</a>.
  short: C. Meier, D. Reuter, C. Riedesel, A.D. Wieck, Journal of Applied Physics
    (2003) 6100–6106.
date_created: 2019-03-28T14:54:53Z
date_updated: 2022-01-06T07:03:59Z
department:
- _id: '15'
- _id: '230'
doi: 10.1063/1.1563032
language:
- iso: eng
page: 6100-6106
publication: Journal of Applied Physics
publication_identifier:
  issn:
  - 0021-8979
  - 1089-7550
publication_status: published
status: public
title: Fabrication of two-dimensional electron systems by focused ion beam doping
  of III/V semiconductor heterostructures
type: journal_article
user_id: '42514'
year: '2003'
...