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2 Publications


2016 | Journal Article | LibreCat-ID: 22577
An efficient PE-ALD process for TiO2 thin films employing a new Ti-precursor
M. Gebhard, F. Mitschker, M. Wiesing, I. Giner, B. Torun, T. de los Arcos, P. Awakowicz, G. Grundmeier, A. Devi, Journal of Materials Chemistry C (2016) 1057–1065.
LibreCat | DOI
 

2013 | Journal Article | LibreCat-ID: 22596
Atomic layer deposition of Er2O3 thin films from Er tris-guanidinate and water: process optimization, film analysis and electrical properties
K. Xu, A.R. Chaudhuri, H. Parala, D. Schwendt, T. de los Arcos, H.J. Osten, A. Devi, Journal of Materials Chemistry C (2013).
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