Engineering high harmonic generation in semiconductors via pulse shaping
M. Reichelt, A. Hildebrandt, A. Walther, J. Förstner, T. Meier, in: Ultrafast Phenomena and Nanophotonics XVI, SPIE, 2012.
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2012 Reichelt,Hildebrandt,Walther,Förstner,Meier_Engineering high harmonic generation in semiconductors via pulse shaping.pdf
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Konferenzbeitrag
| Veröffentlicht
| Englisch
Autor*in
Reichelt, MatthiasLibreCat;
Hildebrandt, Andre;
Walther, Andrea;
Förstner, JensLibreCat
;
Meier, TorstenLibreCat 
Einrichtung
Abstract
Paper Abstract
High harmonic generation is investigated for a two-band model of a semiconductor nanostructure. Similar to an atomic two-level system, the semiconductor emits high harmonic radiation. We show how one can specifically enhance the emission for a given frequency by applying a non-trivially shaped laser pulse. Therefore, the semiconductor Bloch equations including the interband and additionally the intraband dynamics are solved numerically and the spectral shape of the input pulse is computed via an optimization algorithm. It is demonstrated that desired emission frequencies can be favored even though the overall input power is kept constant. We also suggest special metallic nano geometries to achieve enhanced localized optical fields. They are found by geometric optimization.
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Titel des Konferenzbandes
Ultrafast Phenomena and Nanophotonics XVI
forms.conference.field.series_title_volume.label
SPIE Proceedings
Band
8260
Artikelnummer
82601L
Konferenz
Ultrafast Phenomena and Nanophotonics XVI
ISBN
LibreCat-ID
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Reichelt M, Hildebrandt A, Walther A, Förstner J, Meier T. Engineering high harmonic generation in semiconductors via pulse shaping. In: Ultrafast Phenomena and Nanophotonics XVI. Vol 8260. SPIE Proceedings. SPIE; 2012. doi:10.1117/12.906338
Reichelt, M., Hildebrandt, A., Walther, A., Förstner, J., & Meier, T. (2012). Engineering high harmonic generation in semiconductors via pulse shaping. Ultrafast Phenomena and Nanophotonics XVI, 8260, Article 82601L. https://doi.org/10.1117/12.906338
@inproceedings{Reichelt_Hildebrandt_Walther_Förstner_Meier_2012, series={SPIE Proceedings}, title={Engineering high harmonic generation in semiconductors via pulse shaping}, volume={8260}, DOI={10.1117/12.906338}, number={82601L}, booktitle={Ultrafast Phenomena and Nanophotonics XVI}, publisher={SPIE}, author={Reichelt, Matthias and Hildebrandt, Andre and Walther, Andrea and Förstner, Jens and Meier, Torsten}, year={2012}, collection={SPIE Proceedings} }
Reichelt, Matthias, Andre Hildebrandt, Andrea Walther, Jens Förstner, and Torsten Meier. “Engineering High Harmonic Generation in Semiconductors via Pulse Shaping.” In Ultrafast Phenomena and Nanophotonics XVI, Vol. 8260. SPIE Proceedings. SPIE, 2012. https://doi.org/10.1117/12.906338.
M. Reichelt, A. Hildebrandt, A. Walther, J. Förstner, and T. Meier, “Engineering high harmonic generation in semiconductors via pulse shaping,” in Ultrafast Phenomena and Nanophotonics XVI, 2012, vol. 8260, doi: 10.1117/12.906338.
Reichelt, Matthias, et al. “Engineering High Harmonic Generation in Semiconductors via Pulse Shaping.” Ultrafast Phenomena and Nanophotonics XVI, vol. 8260, 82601L, SPIE, 2012, doi:10.1117/12.906338.
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2012 Reichelt,Hildebrandt,Walther,Förstner,Meier_Engineering high harmonic generation in semiconductors via pulse shaping.pdf
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2018-08-21T09:29:41Z