Potential Precursor Alternatives to the Pyrophoric Trimethylaluminium for the Atomic Layer Deposition of Aluminium Oxide

Mai, L., Boysen, N., Zanders, D., de los Arcos de Pedro, M. T., Mitschker, F., Mallick, B., Grundmeier, G., Awakowicz, P., & Devi, A. (2019). Potential Precursor Alternatives to the Pyrophoric Trimethylaluminium for the Atomic Layer Deposition of Aluminium Oxide. Chemistry – A European Journal, 7489–7500. https://doi.org/10.1002/chem.201900475

@article{Mai_Boysen_Zanders_de los Arcos de Pedro_Mitschker_Mallick_Grundmeier_Awakowicz_Devi_2019, title={Potential Precursor Alternatives to the Pyrophoric Trimethylaluminium for the Atomic Layer Deposition of Aluminium Oxide}, DOI={10.1002/chem.201900475}, journal={Chemistry – A European Journal}, author={Mai, Lukas and Boysen, Nils and Zanders, David and de los Arcos de Pedro, Maria Teresa and Mitschker, Felix and Mallick, Bert and Grundmeier, Guido and Awakowicz, Peter and Devi, Anjana}, year={2019}, pages={7489–7500} }

Mai, Lukas, Nils Boysen, David Zanders, Maria Teresa de los Arcos de Pedro, Felix Mitschker, Bert Mallick, Guido Grundmeier, Peter Awakowicz, and Anjana Devi. “Potential Precursor Alternatives to the Pyrophoric Trimethylaluminium for the Atomic Layer Deposition of Aluminium Oxide.” Chemistry – A European Journal, 2019, 7489–7500. https://doi.org/10.1002/chem.201900475.

L. Mai et al., “Potential Precursor Alternatives to the Pyrophoric Trimethylaluminium for the Atomic Layer Deposition of Aluminium Oxide,” Chemistry – A European Journal, pp. 7489–7500, 2019, doi: 10.1002/chem.201900475.

Mai, Lukas, et al. “Potential Precursor Alternatives to the Pyrophoric Trimethylaluminium for the Atomic Layer Deposition of Aluminium Oxide.” Chemistry – A European Journal, 2019, pp. 7489–500, doi:10.1002/chem.201900475.