Order and Melting in Self-Assembled Alkanol Monolayers on Amorphous SiO2

J. Haddad, H.-G. Steinrück, H. Hlaing, S. Kewalramani, D. Pontoni, H. Reichert, B.M. Murphy, S. Festersen, B. Runge, O.M. Magnussen, A. Magerl, M. Deutsch, B.M. Ocko, The Journal of Physical Chemistry C 119 (2015) 17648–17654.

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The Journal of Physical Chemistry C
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119
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17648-17654
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Haddad J, Steinrück H-G, Hlaing H, et al. Order and Melting in Self-Assembled Alkanol Monolayers on Amorphous SiO2. The Journal of Physical Chemistry C. 2015;119:17648-17654. doi:10.1021/acs.jpcc.5b03554
Haddad, J., Steinrück, H.-G., Hlaing, H., Kewalramani, S., Pontoni, D., Reichert, H., Murphy, B. M., Festersen, S., Runge, B., Magnussen, O. M., Magerl, A., Deutsch, M., & Ocko, B. M. (2015). Order and Melting in Self-Assembled Alkanol Monolayers on Amorphous SiO2. The Journal of Physical Chemistry C, 119, 17648–17654. https://doi.org/10.1021/acs.jpcc.5b03554
@article{Haddad_Steinrück_Hlaing_Kewalramani_Pontoni_Reichert_Murphy_Festersen_Runge_Magnussen_et al._2015, title={Order and Melting in Self-Assembled Alkanol Monolayers on Amorphous SiO2}, volume={119}, DOI={10.1021/acs.jpcc.5b03554}, journal={The Journal of Physical Chemistry C}, author={Haddad, Julia and Steinrück, Hans-Georg and Hlaing, Htay and Kewalramani, Sumit and Pontoni, Diego and Reichert, Harald and Murphy, Bridget M. and Festersen, Sven and Runge, Benjamin and Magnussen, Olaf M. and et al.}, year={2015}, pages={17648–17654} }
Haddad, Julia, Hans-Georg Steinrück, Htay Hlaing, Sumit Kewalramani, Diego Pontoni, Harald Reichert, Bridget M. Murphy, et al. “Order and Melting in Self-Assembled Alkanol Monolayers on Amorphous SiO2.” The Journal of Physical Chemistry C 119 (2015): 17648–54. https://doi.org/10.1021/acs.jpcc.5b03554.
J. Haddad et al., “Order and Melting in Self-Assembled Alkanol Monolayers on Amorphous SiO2,” The Journal of Physical Chemistry C, vol. 119, pp. 17648–17654, 2015, doi: 10.1021/acs.jpcc.5b03554.
Haddad, Julia, et al. “Order and Melting in Self-Assembled Alkanol Monolayers on Amorphous SiO2.” The Journal of Physical Chemistry C, vol. 119, 2015, pp. 17648–54, doi:10.1021/acs.jpcc.5b03554.

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