AFM-IR investigation of thin PECVD SiOx films on a polypropylene substrate in the surface-sensitive mode
H. Müller, H. Stadler, T. de los Arcos, A. Keller, G. Grundmeier, Beilstein Journal of Nanotechnology 15 (2024) 603–611.
Download
No fulltext has been uploaded.
Journal Article
| Published
| English
Author
Müller, Hendrik;
Stadler, Hartmut;
de los Arcos, Teresa;
Keller, AdrianLibreCat 
;
Grundmeier, GuidoLibreCat
;
Grundmeier, GuidoLibreCatDepartment
Abstract
<jats:p>Thin silicon oxide films deposited on a polypropylene substrate by plasma-enhanced chemical vapor deposition were investigated using atomic force microscopy-based infrared (AFM-IR) nanospectroscopy in contact and surface-sensitive mode. The focus of this work is the comparison of the different measurement methods (i.e., contact mode and surface-sensitive mode) with respect to the chemical surface sensitivity. The use of the surface-sensitive mode in AFM-IR shows an enormous improvement for the analysis of thin films on the IR-active substrate. As a result, in this mode, the signal of the substrate material could be significantly reduced. Even layers that are so thin that they could hardly be measured in the contact mode can be analyzed with the surface-sensitive mode.</jats:p>
Publishing Year
Journal Title
Beilstein Journal of Nanotechnology
Volume
15
Page
603-611
ISSN
LibreCat-ID
Cite this
Müller H, Stadler H, de los Arcos T, Keller A, Grundmeier G. AFM-IR investigation of thin PECVD SiOx films on a polypropylene substrate in the surface-sensitive mode. Beilstein Journal of Nanotechnology. 2024;15:603-611. doi:10.3762/bjnano.15.51
Müller, H., Stadler, H., de los Arcos, T., Keller, A., & Grundmeier, G. (2024). AFM-IR investigation of thin PECVD SiOx films on a polypropylene substrate in the surface-sensitive mode. Beilstein Journal of Nanotechnology, 15, 603–611. https://doi.org/10.3762/bjnano.15.51
@article{Müller_Stadler_de los Arcos_Keller_Grundmeier_2024, title={AFM-IR investigation of thin PECVD SiOx films on a polypropylene substrate in the surface-sensitive mode}, volume={15}, DOI={10.3762/bjnano.15.51}, journal={Beilstein Journal of Nanotechnology}, publisher={Beilstein Institut}, author={Müller, Hendrik and Stadler, Hartmut and de los Arcos, Teresa and Keller, Adrian and Grundmeier, Guido}, year={2024}, pages={603–611} }
Müller, Hendrik, Hartmut Stadler, Teresa de los Arcos, Adrian Keller, and Guido Grundmeier. “AFM-IR Investigation of Thin PECVD SiOx Films on a Polypropylene Substrate in the Surface-Sensitive Mode.” Beilstein Journal of Nanotechnology 15 (2024): 603–11. https://doi.org/10.3762/bjnano.15.51.
H. Müller, H. Stadler, T. de los Arcos, A. Keller, and G. Grundmeier, “AFM-IR investigation of thin PECVD SiOx films on a polypropylene substrate in the surface-sensitive mode,” Beilstein Journal of Nanotechnology, vol. 15, pp. 603–611, 2024, doi: 10.3762/bjnano.15.51.
Müller, Hendrik, et al. “AFM-IR Investigation of Thin PECVD SiOx Films on a Polypropylene Substrate in the Surface-Sensitive Mode.” Beilstein Journal of Nanotechnology, vol. 15, Beilstein Institut, 2024, pp. 603–11, doi:10.3762/bjnano.15.51.
Google Scholar