PECVD and PEALD on polymer substrates (part II): Understanding and tuning of barrier and membrane properties of thin films
M.T. de los Arcos de Pedro, P. Awakowicz, M. Böke, N. Boysen, R.P. Brinkmann, R. Dahlmann, A. Devi, D. Eremin, J. Franke, T. Gergs, J. Jenderny, E. Kemaneci, T.D. Kühne, S. Kusmierz, T. Mussenbrock, J. Rubner, J. Trieschmann, M. Wessling, X. Xie, D. Zanders, F. Zysk, G. Grundmeier, PLASMA PROCESSES AND POLYMERS (2023) e2300186.
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Journal Article
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Author
de los Arcos de Pedro, Maria TeresaLibreCat 
;
Awakowicz, Peter;
Böke, Marc;
Boysen, Nils;
Brinkmann, Ralf Peter;
Dahlmann, Rainer;
Devi, Anjana;
Eremin, Denis;
Franke, Jonas;
Gergs, Tobias;
Jenderny, Jonathan;
Kemaneci, Efe
All
;
Awakowicz, Peter;
Böke, Marc;
Boysen, Nils;
Brinkmann, Ralf Peter;
Dahlmann, Rainer;
Devi, Anjana;
Eremin, Denis;
Franke, Jonas;
Gergs, Tobias;
Jenderny, Jonathan;
Kemaneci, Efe
All
Department
Abstract
Plasma Processes and Polymers is a plasma journal focusing on the interdisciplinary field of low temperature plasma science.
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Journal Title
PLASMA PROCESSES AND POLYMERS
Page
e2300186
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LibreCat-ID
Cite this
de los Arcos de Pedro MT, Awakowicz P, Böke M, et al. PECVD and PEALD on polymer substrates (part II): Understanding and tuning of barrier and membrane properties of thin films. PLASMA PROCESSES AND POLYMERS. Published online 2023:e2300186. doi:10.1002/ppap.202300186
de los Arcos de Pedro, M. T., Awakowicz, P., Böke, M., Boysen, N., Brinkmann, R. P., Dahlmann, R., Devi, A., Eremin, D., Franke, J., Gergs, T., Jenderny, J., Kemaneci, E., Kühne, T. D., Kusmierz, S., Mussenbrock, T., Rubner, J., Trieschmann, J., Wessling, M., Xie, X., … Grundmeier, G. (2023). PECVD and PEALD on polymer substrates (part II): Understanding and tuning of barrier and membrane properties of thin films. PLASMA PROCESSES AND POLYMERS, e2300186. https://doi.org/10.1002/ppap.202300186
@article{de los Arcos de Pedro_Awakowicz_Böke_Boysen_Brinkmann_Dahlmann_Devi_Eremin_Franke_Gergs_et al._2023, title={PECVD and PEALD on polymer substrates (part II): Understanding and tuning of barrier and membrane properties of thin films}, DOI={10.1002/ppap.202300186}, journal={PLASMA PROCESSES AND POLYMERS}, author={de los Arcos de Pedro, Maria Teresa and Awakowicz, Peter and Böke, Marc and Boysen, Nils and Brinkmann, Ralf Peter and Dahlmann, Rainer and Devi, Anjana and Eremin, Denis and Franke, Jonas and Gergs, Tobias and et al.}, year={2023}, pages={e2300186} }
Arcos de Pedro, Maria Teresa de los, Peter Awakowicz, Marc Böke, Nils Boysen, Ralf Peter Brinkmann, Rainer Dahlmann, Anjana Devi, et al. “PECVD and PEALD on Polymer Substrates (Part II): Understanding and Tuning of Barrier and Membrane Properties of Thin Films.” PLASMA PROCESSES AND POLYMERS, 2023, e2300186. https://doi.org/10.1002/ppap.202300186.
M. T. de los Arcos de Pedro et al., “PECVD and PEALD on polymer substrates (part II): Understanding and tuning of barrier and membrane properties of thin films,” PLASMA PROCESSES AND POLYMERS, p. e2300186, 2023, doi: 10.1002/ppap.202300186.
de los Arcos de Pedro, Maria Teresa, et al. “PECVD and PEALD on Polymer Substrates (Part II): Understanding and Tuning of Barrier and Membrane Properties of Thin Films.” PLASMA PROCESSES AND POLYMERS, 2023, p. e2300186, doi:10.1002/ppap.202300186.
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