Robustness of the Quantum Hall Effect, Sample Size Versus Sample Topology, and Quality Control Management of III–V Molecular Beam Epitaxy

Tscheuschner, R. D., Hoch, S., Leschinsky, E., Meier, C., Theis, S., & Wieck, A. D. (1998). Robustness of the Quantum Hall Effect, Sample Size Versus Sample Topology, and Quality Control Management of III–V Molecular Beam Epitaxy. International Journal of Modern Physics B, 12(11), 1147–1170. https://doi.org/10.1142/s0217979298000636

@article{Tscheuschner_Hoch_Leschinsky_Meier_Theis_Wieck_1998, title={Robustness of the Quantum Hall Effect, Sample Size Versus Sample Topology, and Quality Control Management of III–V Molecular Beam Epitaxy}, volume={12}, DOI={10.1142/s0217979298000636}, number={11}, journal={International Journal of Modern Physics B}, publisher={World Scientific Pub Co Pte Lt}, author={Tscheuschner, Ralf D. and Hoch, Sascha and Leschinsky, Eva and Meier, Cedrik and Theis, Sabine and Wieck, Andreas D.}, year={1998}, pages={1147–1170} }

Tscheuschner, Ralf D., Sascha Hoch, Eva Leschinsky, Cedrik Meier, Sabine Theis, and Andreas D. Wieck. “Robustness of the Quantum Hall Effect, Sample Size Versus Sample Topology, and Quality Control Management of III–V Molecular Beam Epitaxy.” International Journal of Modern Physics B 12, no. 11 (1998): 1147–70. https://doi.org/10.1142/s0217979298000636.

R. D. Tscheuschner, S. Hoch, E. Leschinsky, C. Meier, S. Theis, and A. D. Wieck, “Robustness of the Quantum Hall Effect, Sample Size Versus Sample Topology, and Quality Control Management of III–V Molecular Beam Epitaxy,” International Journal of Modern Physics B, vol. 12, no. 11, pp. 1147–1170, 1998.

Tscheuschner, Ralf D., et al. “Robustness of the Quantum Hall Effect, Sample Size Versus Sample Topology, and Quality Control Management of III–V Molecular Beam Epitaxy.” International Journal of Modern Physics B, vol. 12, no. 11, World Scientific Pub Co Pte Lt, 1998, pp. 1147–70, doi:10.1142/s0217979298000636.