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125 Publications
2009 | Journal Article | LibreCat-ID: 40201
Andersen UL, Leuchs G, Silberhorn C. Continuous-variable quantum information processing. Laser & Photonics Reviews. 2009;4(3):337-354. doi:10.1002/lpor.200910010
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2008 | Journal Article | LibreCat-ID: 41279
Wu J-M, Antonietti M, Gross S, Bauer M, Smarsly BM. Ordered Mesoporous Thin Films of Rutile TiO2 Nanocrystals Mixed with Amorphous Ta2O5. ChemPhysChem. 2008;9(5):748-757. doi:10.1002/cphc.200700679
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2007 | Journal Article | LibreCat-ID: 39978
Matthias H, Schweizer SL, Wehrspohn RB, Kitzerow H-S. Liquid crystal director fields in micropores of photonic crystals. Journal of Optics A: Pure and Applied Optics. 2007;9(9):S389-S395. doi:10.1088/1464-4258/9/9/s18
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2005 | Journal Article | LibreCat-ID: 39973
Kitzerow H-S. News about Soft Condensed Matter—A Liquid Crystal Meeting Review. ChemPhysChem. 2005;2(10):628-632. doi:10.1002/1439-7641(20011015)2:10<628::aid-cphc628>3.0.co;2-7
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2005 | Journal Article | LibreCat-ID: 39993
Mießen N, Strauß J, Hoischen A, Kürschner K, Kitzerow H-S. Durable Micropatterns Obtained from Dissipative Structures in Liquid Crystals. ChemPhysChem. 2005;2(11):691-694. doi:10.1002/1439-7641(20011119)2:11<691::aid-cphc691>3.0.co;2-s
LibreCat
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2003 | Journal Article | LibreCat-ID: 39851
Pannemann Ch, Diekmann T, Hilleringmann U. Nanometer scale organic thin film transistors with Pentacene. Microelectronic Engineering. 2003;67-68:845-852. doi:10.1016/s0167-9317(03)00146-1
LibreCat
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2002 | Journal Article | LibreCat-ID: 39912
Schönstein I, Müller J, Hilleringmann U, Goser K. Characterization of submicron NMOS devices due to visible light emission. Microelectronic Engineering. 2002;21(1-4):363-366. doi:10.1016/0167-9317(93)90092-j
LibreCat
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2002 | Journal Article | LibreCat-ID: 39914
Hilleringmann U, Goser K. Results of monolithic integration of optical waveguides, photodiodes and CMOS circuits on silicon. Microelectronic Engineering. 2002;19(1-4):211-214. doi:10.1016/0167-9317(92)90425-q
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2002 | Journal Article | LibreCat-ID: 39899
Horstmann JT, Hilleringmann U, Goser K. Characterisation of sub-100 nm-MOS-transistors processed by optical lithography and a sidewall-etchback technique. Microelectronic Engineering. 2002;30(1-4):431-434. doi:10.1016/0167-9317(95)00280-4
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2002 | Journal Article | LibreCat-ID: 39882
Mankowski V, Hilleringmann U, Schumacher K. A novel insulation technique for smart power switching devices and very high voltage ICs above 10 kV. Microelectronic Engineering. 2002;53(1-4):525-528. doi:10.1016/s0167-9317(00)00370-1
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