Optical in-situ temperature management for high-quality ZnO molecular beam epitaxy

M. Albert, C. Golla, C. Meier, Journal of Crystal Growth (2020).

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Journal Article | Published | English
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Journal of Crystal Growth
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126009
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Albert M, Golla C, Meier C. Optical in-situ temperature management for high-quality ZnO molecular beam epitaxy. Journal of Crystal Growth. 2020. doi:10.1016/j.jcrysgro.2020.126009
Albert, M., Golla, C., & Meier, C. (2020). Optical in-situ temperature management for high-quality ZnO molecular beam epitaxy. Journal of Crystal Growth. https://doi.org/10.1016/j.jcrysgro.2020.126009
@article{Albert_Golla_Meier_2020, title={Optical in-situ temperature management for high-quality ZnO molecular beam epitaxy}, DOI={10.1016/j.jcrysgro.2020.126009}, number={126009}, journal={Journal of Crystal Growth}, author={Albert, M. and Golla, C. and Meier, Cedrik}, year={2020} }
Albert, M., C. Golla, and Cedrik Meier. “Optical In-Situ Temperature Management for High-Quality ZnO Molecular Beam Epitaxy.” Journal of Crystal Growth, 2020. https://doi.org/10.1016/j.jcrysgro.2020.126009.
M. Albert, C. Golla, and C. Meier, “Optical in-situ temperature management for high-quality ZnO molecular beam epitaxy,” Journal of Crystal Growth, 2020.
Albert, M., et al. “Optical In-Situ Temperature Management for High-Quality ZnO Molecular Beam Epitaxy.” Journal of Crystal Growth, 126009, 2020, doi:10.1016/j.jcrysgro.2020.126009.

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