Optical in-situ temperature management for high-quality ZnO molecular beam epitaxy

M. Albert, C. Golla, C. Meier, Journal of Crystal Growth 557 (2021).

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Journal Article | Published | English
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Journal Title
Journal of Crystal Growth
Volume
557
Article Number
126009
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Albert M, Golla C, Meier C. Optical in-situ temperature management for high-quality ZnO molecular beam epitaxy. Journal of Crystal Growth. 2021;557. doi:10.1016/j.jcrysgro.2020.126009
Albert, M., Golla, C., & Meier, C. (2021). Optical in-situ temperature management for high-quality ZnO molecular beam epitaxy. Journal of Crystal Growth, 557. https://doi.org/10.1016/j.jcrysgro.2020.126009
@article{Albert_Golla_Meier_2021, title={Optical in-situ temperature management for high-quality ZnO molecular beam epitaxy}, volume={557}, DOI={10.1016/j.jcrysgro.2020.126009}, number={126009}, journal={Journal of Crystal Growth}, author={Albert, M. and Golla, C. and Meier, Cedrik}, year={2021} }
Albert, M., C. Golla, and Cedrik Meier. “Optical In-Situ Temperature Management for High-Quality ZnO Molecular Beam Epitaxy.” Journal of Crystal Growth 557 (2021). https://doi.org/10.1016/j.jcrysgro.2020.126009.
M. Albert, C. Golla, and C. Meier, “Optical in-situ temperature management for high-quality ZnO molecular beam epitaxy,” Journal of Crystal Growth, vol. 557, 2021.
Albert, M., et al. “Optical In-Situ Temperature Management for High-Quality ZnO Molecular Beam Epitaxy.” Journal of Crystal Growth, vol. 557, 126009, 2021, doi:10.1016/j.jcrysgro.2020.126009.

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