Connection between target poisoning and current waveforms in reactive high-power impulse magnetron sputtering of chromium

Layes, V., Corbella, C., Monjé, S., Schulz-von der Gathen, V., von Keudell, A., & de los Arcos de Pedro, M. T. (2018). Connection between target poisoning and current waveforms in reactive high-power impulse magnetron sputtering of chromium. Plasma Sources Science and Technology, Article 084004. https://doi.org/10.1088/1361-6595/aad0e2

@article{Layes_Corbella_Monjé_Schulz-von der Gathen_von Keudell_de los Arcos de Pedro_2018, title={Connection between target poisoning and current waveforms in reactive high-power impulse magnetron sputtering of chromium}, DOI={10.1088/1361-6595/aad0e2}, number={084004}, journal={Plasma Sources Science and Technology}, author={Layes, Vincent and Corbella, Carles and Monjé, Sascha and Schulz-von der Gathen, Volker and von Keudell, Achim and de los Arcos de Pedro, Maria Teresa}, year={2018} }

Layes, Vincent, Carles Corbella, Sascha Monjé, Volker Schulz-von der Gathen, Achim von Keudell, and Maria Teresa de los Arcos de Pedro. “Connection between Target Poisoning and Current Waveforms in Reactive High-Power Impulse Magnetron Sputtering of Chromium.” Plasma Sources Science and Technology, 2018. https://doi.org/10.1088/1361-6595/aad0e2.

V. Layes, C. Corbella, S. Monjé, V. Schulz-von der Gathen, A. von Keudell, and M. T. de los Arcos de Pedro, “Connection between target poisoning and current waveforms in reactive high-power impulse magnetron sputtering of chromium,” Plasma Sources Science and Technology, Art. no. 084004, 2018, doi: 10.1088/1361-6595/aad0e2.

Layes, Vincent, et al. “Connection between Target Poisoning and Current Waveforms in Reactive High-Power Impulse Magnetron Sputtering of Chromium.” Plasma Sources Science and Technology, 084004, 2018, doi:10.1088/1361-6595/aad0e2.