Water assisted atomic layer deposition of yttrium oxide using tris(N,N′-diisopropyl-2-dimethylamido-guanidinato) yttrium(iii): process development, film characterization and functional properties
L. Mai, N. Boysen, E. Subaşı, M.T. de los Arcos de Pedro, D. Rogalla, G. Grundmeier, C. Bock, H.-L. Lu, A. Devi, RSC Advances (2018) 4987–4994.
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Journal Article
| Published
| English
Author
Mai, Lukas;
Boysen, Nils;
Subaşı, Ersoy;
de los Arcos de Pedro, Maria TeresaLibreCat;
Rogalla, Detlef;
Grundmeier, GuidoLibreCat;
Bock, Claudia;
Lu, Hong-Liang;
Devi, Anjana
Department
Abstract
<p>A new water assisted atomic layer deposition (ALD) process was developed using the yttrium tris-guanidinate precursor which resulted in device quality thin films.</p>
Publishing Year
Journal Title
RSC Advances
Page
4987-4994
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LibreCat-ID
Cite this
Mai L, Boysen N, Subaşı E, et al. Water assisted atomic layer deposition of yttrium oxide using tris(N,N′-diisopropyl-2-dimethylamido-guanidinato) yttrium(iii): process development, film characterization and functional properties. RSC Advances. Published online 2018:4987-4994. doi:10.1039/c7ra13417g
Mai, L., Boysen, N., Subaşı, E., de los Arcos de Pedro, M. T., Rogalla, D., Grundmeier, G., Bock, C., Lu, H.-L., & Devi, A. (2018). Water assisted atomic layer deposition of yttrium oxide using tris(N,N′-diisopropyl-2-dimethylamido-guanidinato) yttrium(iii): process development, film characterization and functional properties. RSC Advances, 4987–4994. https://doi.org/10.1039/c7ra13417g
@article{Mai_Boysen_Subaşı_de los Arcos de Pedro_Rogalla_Grundmeier_Bock_Lu_Devi_2018, title={Water assisted atomic layer deposition of yttrium oxide using tris(N,N′-diisopropyl-2-dimethylamido-guanidinato) yttrium(iii): process development, film characterization and functional properties}, DOI={10.1039/c7ra13417g}, journal={RSC Advances}, author={Mai, Lukas and Boysen, Nils and Subaşı, Ersoy and de los Arcos de Pedro, Maria Teresa and Rogalla, Detlef and Grundmeier, Guido and Bock, Claudia and Lu, Hong-Liang and Devi, Anjana}, year={2018}, pages={4987–4994} }
Mai, Lukas, Nils Boysen, Ersoy Subaşı, Maria Teresa de los Arcos de Pedro, Detlef Rogalla, Guido Grundmeier, Claudia Bock, Hong-Liang Lu, and Anjana Devi. “Water Assisted Atomic Layer Deposition of Yttrium Oxide Using Tris(N,N′-Diisopropyl-2-Dimethylamido-Guanidinato) Yttrium(Iii): Process Development, Film Characterization and Functional Properties.” RSC Advances, 2018, 4987–94. https://doi.org/10.1039/c7ra13417g.
L. Mai et al., “Water assisted atomic layer deposition of yttrium oxide using tris(N,N′-diisopropyl-2-dimethylamido-guanidinato) yttrium(iii): process development, film characterization and functional properties,” RSC Advances, pp. 4987–4994, 2018, doi: 10.1039/c7ra13417g.
Mai, Lukas, et al. “Water Assisted Atomic Layer Deposition of Yttrium Oxide Using Tris(N,N′-Diisopropyl-2-Dimethylamido-Guanidinato) Yttrium(Iii): Process Development, Film Characterization and Functional Properties.” RSC Advances, 2018, pp. 4987–94, doi:10.1039/c7ra13417g.
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