Electric potential screening on metal targets submitted to reactive sputtering
C. Corbella, A. Marcak, A. von Keudell, M.T. de los Arcos de Pedro, Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films (2016).
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Journal Article
| Published
| English
Author
Corbella, Carles;
Marcak, Adrian;
von Keudell, Achim;
de los Arcos de Pedro, Maria TeresaLibreCat
Department
Publishing Year
Journal Title
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
Article Number
021307
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Corbella C, Marcak A, von Keudell A, de los Arcos de Pedro MT. Electric potential screening on metal targets submitted to reactive sputtering. Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. Published online 2016. doi:10.1116/1.4972566
Corbella, C., Marcak, A., von Keudell, A., & de los Arcos de Pedro, M. T. (2016). Electric potential screening on metal targets submitted to reactive sputtering. Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, Article 021307. https://doi.org/10.1116/1.4972566
@article{Corbella_Marcak_von Keudell_de los Arcos de Pedro_2016, title={Electric potential screening on metal targets submitted to reactive sputtering}, DOI={10.1116/1.4972566}, number={021307}, journal={Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films}, author={Corbella, Carles and Marcak, Adrian and von Keudell, Achim and de los Arcos de Pedro, Maria Teresa}, year={2016} }
Corbella, Carles, Adrian Marcak, Achim von Keudell, and Maria Teresa de los Arcos de Pedro. “Electric Potential Screening on Metal Targets Submitted to Reactive Sputtering.” Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, 2016. https://doi.org/10.1116/1.4972566.
C. Corbella, A. Marcak, A. von Keudell, and M. T. de los Arcos de Pedro, “Electric potential screening on metal targets submitted to reactive sputtering,” Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, Art. no. 021307, 2016, doi: 10.1116/1.4972566.
Corbella, Carles, et al. “Electric Potential Screening on Metal Targets Submitted to Reactive Sputtering.” Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, 021307, 2016, doi:10.1116/1.4972566.
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