Unearthing [3-(Dimethylamino)propyl]aluminium(III) Complexes as Novel Atomic Layer Deposition (ALD) Precursors for Al2 O3 : Synthesis, Characterization and ALD Process Development

L. Mai, M. Gebhard, T. de los Arcos, I. Giner, F. Mitschker, M. Winter, H. Parala, P. Awakowicz, G. Grundmeier, A. Devi, Chemistry - A European Journal (2017) 10768–10772.

Download
No fulltext has been uploaded.
Journal Article | Published | English
Author
; ; ; ; ; ; ; ; ;
Publishing Year
Journal Title
Chemistry - A European Journal
Page
10768-10772
ISSN
LibreCat-ID

Cite this

Mai L, Gebhard M, de los Arcos T, et al. Unearthing [3-(Dimethylamino)propyl]aluminium(III) Complexes as Novel Atomic Layer Deposition (ALD) Precursors for Al2 O3 : Synthesis, Characterization and ALD Process Development. Chemistry - A European Journal. 2017:10768-10772. doi:10.1002/chem.201702939
Mai, L., Gebhard, M., de los Arcos, T., Giner, I., Mitschker, F., Winter, M., … Devi, A. (2017). Unearthing [3-(Dimethylamino)propyl]aluminium(III) Complexes as Novel Atomic Layer Deposition (ALD) Precursors for Al2 O3 : Synthesis, Characterization and ALD Process Development. Chemistry - A European Journal, 10768–10772. https://doi.org/10.1002/chem.201702939
@article{Mai_Gebhard_de los Arcos_Giner_Mitschker_Winter_Parala_Awakowicz_Grundmeier_Devi_2017, title={Unearthing [3-(Dimethylamino)propyl]aluminium(III) Complexes as Novel Atomic Layer Deposition (ALD) Precursors for Al2 O3 : Synthesis, Characterization and ALD Process Development}, DOI={10.1002/chem.201702939}, journal={Chemistry - A European Journal}, author={Mai, Lukas and Gebhard, Maximilian and de los Arcos, Teresa and Giner, Ignacio and Mitschker, Felix and Winter, Manuela and Parala, Harish and Awakowicz, Peter and Grundmeier, Guido and Devi, Anjana}, year={2017}, pages={10768–10772} }
Mai, Lukas, Maximilian Gebhard, Teresa de los Arcos, Ignacio Giner, Felix Mitschker, Manuela Winter, Harish Parala, Peter Awakowicz, Guido Grundmeier, and Anjana Devi. “Unearthing [3-(Dimethylamino)Propyl]Aluminium(III) Complexes as Novel Atomic Layer Deposition (ALD) Precursors for Al2: Synthesis, Characterization and ALD Process Development.” Chemistry - A European Journal, 2017, 10768–72. https://doi.org/10.1002/chem.201702939.
L. Mai et al., “Unearthing [3-(Dimethylamino)propyl]aluminium(III) Complexes as Novel Atomic Layer Deposition (ALD) Precursors for Al2 O3 : Synthesis, Characterization and ALD Process Development,” Chemistry - A European Journal, pp. 10768–10772, 2017.
Mai, Lukas, et al. “Unearthing [3-(Dimethylamino)Propyl]Aluminium(III) Complexes as Novel Atomic Layer Deposition (ALD) Precursors for Al2: Synthesis, Characterization and ALD Process Development.” Chemistry - A European Journal, 2017, pp. 10768–72, doi:10.1002/chem.201702939.

Export

Marked Publications

Open Data LibreCat

Search this title in

Google Scholar