Electrical and optical properties of TiO2thin films prepared by plasma-enhanced atomic layer deposition
V.-S. Dang, H. Parala, J.H. Kim, K. Xu, N.B. Srinivasan, E. Edengeiser, M. Havenith, A.D. Wieck, M.T. de los Arcos de Pedro, Roland.A. Fischer, A. Devi, Physica Status Solidi (a) (2013) 416–424.
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Journal Article
| Published
| English
Author
Dang, Van-Son;
Parala, Harish;
Kim, Jin Hyun;
Xu, Ke;
Srinivasan, Nagendra B.;
Edengeiser, Eugen;
Havenith, Martina;
Wieck, Andreas D.;
de los Arcos de Pedro, Maria TeresaLibreCat;
Fischer, Roland. A.;
Devi, Anjana
Department
Publishing Year
Journal Title
physica status solidi (a)
Page
416-424
ISSN
LibreCat-ID
Cite this
Dang V-S, Parala H, Kim JH, et al. Electrical and optical properties of TiO2thin films prepared by plasma-enhanced atomic layer deposition. physica status solidi (a). Published online 2013:416-424. doi:10.1002/pssa.201330115
Dang, V.-S., Parala, H., Kim, J. H., Xu, K., Srinivasan, N. B., Edengeiser, E., Havenith, M., Wieck, A. D., de los Arcos de Pedro, M. T., Fischer, Roland. A., & Devi, A. (2013). Electrical and optical properties of TiO2thin films prepared by plasma-enhanced atomic layer deposition. Physica Status Solidi (a), 416–424. https://doi.org/10.1002/pssa.201330115
@article{Dang_Parala_Kim_Xu_Srinivasan_Edengeiser_Havenith_Wieck_de los Arcos de Pedro_Fischer_et al._2013, title={Electrical and optical properties of TiO2thin films prepared by plasma-enhanced atomic layer deposition}, DOI={10.1002/pssa.201330115}, journal={physica status solidi (a)}, author={Dang, Van-Son and Parala, Harish and Kim, Jin Hyun and Xu, Ke and Srinivasan, Nagendra B. and Edengeiser, Eugen and Havenith, Martina and Wieck, Andreas D. and de los Arcos de Pedro, Maria Teresa and Fischer, Roland. A. and et al.}, year={2013}, pages={416–424} }
Dang, Van-Son, Harish Parala, Jin Hyun Kim, Ke Xu, Nagendra B. Srinivasan, Eugen Edengeiser, Martina Havenith, et al. “Electrical and Optical Properties of TiO2thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition.” Physica Status Solidi (a), 2013, 416–24. https://doi.org/10.1002/pssa.201330115.
V.-S. Dang et al., “Electrical and optical properties of TiO2thin films prepared by plasma-enhanced atomic layer deposition,” physica status solidi (a), pp. 416–424, 2013, doi: 10.1002/pssa.201330115.
Dang, Van-Son, et al. “Electrical and Optical Properties of TiO2thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition.” Physica Status Solidi (a), 2013, pp. 416–24, doi:10.1002/pssa.201330115.
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