Plasma-Enhanced Chemical Vapor Deposition (PE-CVD) yields better Hydrolytical Stability of Biocompatible SiOx Thin Films on Implant Alumina Ceramics compared to Rapid Thermal Evaporation Physical Vapor Deposition (PVD)
F. Böke, I. Giner, A. Keller, G. Grundmeier, H. Fischer, ACS Applied Materials & Interfaces 8 (2016) 17805–17816.
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ACS Applied Materials & Interfaces
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Böke F, Giner I, Keller A, Grundmeier G, Fischer H. Plasma-Enhanced Chemical Vapor Deposition (PE-CVD) yields better Hydrolytical Stability of Biocompatible SiOx Thin Films on Implant Alumina Ceramics compared to Rapid Thermal Evaporation Physical Vapor Deposition (PVD). ACS Applied Materials & Interfaces. 2016;8:17805-17816. doi:10.1021/acsami.6b04421
Böke, F., Giner, I., Keller, A., Grundmeier, G., & Fischer, H. (2016). Plasma-Enhanced Chemical Vapor Deposition (PE-CVD) yields better Hydrolytical Stability of Biocompatible SiOx Thin Films on Implant Alumina Ceramics compared to Rapid Thermal Evaporation Physical Vapor Deposition (PVD). ACS Applied Materials & Interfaces, 8, 17805–17816. https://doi.org/10.1021/acsami.6b04421
@article{Böke_Giner_Keller_Grundmeier_Fischer_2016, title={Plasma-Enhanced Chemical Vapor Deposition (PE-CVD) yields better Hydrolytical Stability of Biocompatible SiOx Thin Films on Implant Alumina Ceramics compared to Rapid Thermal Evaporation Physical Vapor Deposition (PVD)}, volume={8}, DOI={10.1021/acsami.6b04421}, journal={ACS Applied Materials & Interfaces}, author={Böke, Frederik and Giner, Ignacio and Keller, Adrian and Grundmeier, Guido and Fischer, Horst}, year={2016}, pages={17805–17816} }
Böke, Frederik, Ignacio Giner, Adrian Keller, Guido Grundmeier, and Horst Fischer. “Plasma-Enhanced Chemical Vapor Deposition (PE-CVD) Yields Better Hydrolytical Stability of Biocompatible SiOx Thin Films on Implant Alumina Ceramics Compared to Rapid Thermal Evaporation Physical Vapor Deposition (PVD).” ACS Applied Materials & Interfaces 8 (2016): 17805–16. https://doi.org/10.1021/acsami.6b04421.
F. Böke, I. Giner, A. Keller, G. Grundmeier, and H. Fischer, “Plasma-Enhanced Chemical Vapor Deposition (PE-CVD) yields better Hydrolytical Stability of Biocompatible SiOx Thin Films on Implant Alumina Ceramics compared to Rapid Thermal Evaporation Physical Vapor Deposition (PVD),” ACS Applied Materials & Interfaces, vol. 8, pp. 17805–17816, 2016.
Böke, Frederik, et al. “Plasma-Enhanced Chemical Vapor Deposition (PE-CVD) Yields Better Hydrolytical Stability of Biocompatible SiOx Thin Films on Implant Alumina Ceramics Compared to Rapid Thermal Evaporation Physical Vapor Deposition (PVD).” ACS Applied Materials & Interfaces, vol. 8, 2016, pp. 17805–16, doi:10.1021/acsami.6b04421.
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