Oxygen diffusivity in silicon derived from dynamical X-ray diffraction

J. Will, A. Gröschel, D. Kot, M.A. Schubert, C. Bergmann, H.-G. Steinrück, G. Kissinger, A. Magerl, Journal of Applied Physics 7 (2013) 073508.

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Journal Article | Published | English
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Journal of Applied Physics
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7
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073508
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Will J, Gröschel A, Kot D, et al. Oxygen diffusivity in silicon derived from dynamical X-ray diffraction. Journal of Applied Physics. 2013;7:073508. doi:10.1063/1.4792747
Will, J., Gröschel, A., Kot, D., Schubert, M. A., Bergmann, C., Steinrück, H.-G., Kissinger, G., & Magerl, A. (2013). Oxygen diffusivity in silicon derived from dynamical X-ray diffraction. Journal of Applied Physics, 7, 073508. https://doi.org/10.1063/1.4792747
@article{Will_Gröschel_Kot_Schubert_Bergmann_Steinrück_Kissinger_Magerl_2013, title={Oxygen diffusivity in silicon derived from dynamical X-ray diffraction}, volume={7}, DOI={10.1063/1.4792747}, journal={Journal of Applied Physics}, author={Will, J. and Gröschel, A. and Kot, D. and Schubert, M. A. and Bergmann, C. and Steinrück, Hans-Georg and Kissinger, G. and Magerl, A.}, year={2013}, pages={073508} }
Will, J., A. Gröschel, D. Kot, M. A. Schubert, C. Bergmann, Hans-Georg Steinrück, G. Kissinger, and A. Magerl. “Oxygen Diffusivity in Silicon Derived from Dynamical X-Ray Diffraction.” Journal of Applied Physics 7 (2013): 073508. https://doi.org/10.1063/1.4792747.
J. Will et al., “Oxygen diffusivity in silicon derived from dynamical X-ray diffraction,” Journal of Applied Physics, vol. 7, p. 073508, 2013, doi: 10.1063/1.4792747.
Will, J., et al. “Oxygen Diffusivity in Silicon Derived from Dynamical X-Ray Diffraction.” Journal of Applied Physics, vol. 7, 2013, p. 073508, doi:10.1063/1.4792747.

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