Aluminum oxidation by a remote electron cyclotron resonance plasma in magnetic tunnel junctions
A. Thomas, H. Brückl, M. Sacher, J. Schmalhorst, G. Reiss, Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures 21 (2003).
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| English
Author
Thomas, A.;
Brückl, H.;
Sacher, MarcLibreCat 
;
Schmalhorst, J.;
Reiss, G.
;
Schmalhorst, J.;
Reiss, G.Department
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Journal Title
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
Volume
21
Issue
5
Article Number
2120
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Thomas A, Brückl H, Sacher M, Schmalhorst J, Reiss G. Aluminum oxidation by a remote electron cyclotron resonance plasma in magnetic tunnel junctions. Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. 2003;21(5). doi:10.1116/1.1609480
Thomas, A., Brückl, H., Sacher, M., Schmalhorst, J., & Reiss, G. (2003). Aluminum oxidation by a remote electron cyclotron resonance plasma in magnetic tunnel junctions. Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 21(5), Article 2120. https://doi.org/10.1116/1.1609480
@article{Thomas_Brückl_Sacher_Schmalhorst_Reiss_2003, title={Aluminum oxidation by a remote electron cyclotron resonance plasma in magnetic tunnel junctions}, volume={21}, DOI={10.1116/1.1609480}, number={52120}, journal={Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures}, publisher={American Vacuum Society}, author={Thomas, A. and Brückl, H. and Sacher, Marc and Schmalhorst, J. and Reiss, G.}, year={2003} }
Thomas, A., H. Brückl, Marc Sacher, J. Schmalhorst, and G. Reiss. “Aluminum Oxidation by a Remote Electron Cyclotron Resonance Plasma in Magnetic Tunnel Junctions.” Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures 21, no. 5 (2003). https://doi.org/10.1116/1.1609480.
A. Thomas, H. Brückl, M. Sacher, J. Schmalhorst, and G. Reiss, “Aluminum oxidation by a remote electron cyclotron resonance plasma in magnetic tunnel junctions,” Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, vol. 21, no. 5, Art. no. 2120, 2003, doi: 10.1116/1.1609480.
Thomas, A., et al. “Aluminum Oxidation by a Remote Electron Cyclotron Resonance Plasma in Magnetic Tunnel Junctions.” Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, vol. 21, no. 5, 2120, American Vacuum Society, 2003, doi:10.1116/1.1609480.
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